Ballistic and thermalized regimes to tune structure and conducting properties of W-Mo thin films

Co-GLAD sputtering of tungsten-based nanostructured metallic thin films

A structural and electrical study of tungsten-based metal thin films prepared by co-sputtering GLAD is the subject of this thesis. For this purpose, three different systems (W-W, W-Ag and W-Mo) have been developed using two opposite metallic targets (tilt angle α = 80° with the substrate). In addition to the choice of the second metallic element, different parameters involved in the growth of these films have undergone a variation (working pressure, thickness and second target current) to understand their influence on structural and electrical behaviors of these films. All three systems present a columnar and porous structure. The morphology of these films (especially the inclination of the…

Oblique angle co-deposition of nanocolumnar tungsten thin films with two W sources: Effect of pressure and target current

Two series of tungsten thin films are sputtered on silicon and glass substrates by oblique angle co-deposition technique with an original configuration. Two opposite distinct tungsten targets are simultaneously used, both tilted with an oblique angle of 80°. The growth is performed at low (0.33 Pa) and high (1.5 Pa) argon sputtering pressure and the current intensity applied to the targets varies between 50 and 250 mA. The effect of these deposition parameters on the films microstructure and electrical properties is investigated by scanning and transmission electron microscopy, X-ray diffraction and pole figures, and van der Pauw method. Due to self-shadowing effect, all tungsten sputtered …