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RESEARCH PRODUCT

Co-GLAD sputtering of tungsten-based nanostructured metallic thin films

subject

description

A structural and electrical study of tungsten-based metal thin films prepared by co-sputtering GLAD is the subject of this thesis. For this purpose, three different systems (W-W, W-Ag and W-Mo) have been developed using two opposite metallic targets (tilt angle α = 80° with the substrate). In addition to the choice of the second metallic element, different parameters involved in the growth of these films have undergone a variation (working pressure, thickness and second target current) to understand their influence on structural and electrical behaviors of these films. All three systems present a columnar and porous structure. The morphology of these films (especially the inclination of the columns) and their crystallographic structure strongly depend on the experimental parameters as well as on the nature of the second element associated with W. The structural and crystallographic evolution of these films influences their electrical properties. Calculations of the thermalization degree carried out for W and Mo have allowed to verify that the selected pressure values correspond to ballistic or thermalized regimes and to better understand the different structural and electrical properties obtained for each regime. Finally, a Janus structure (columnar or checkerboard) has been produced for the W-Mo system and not for W-Ag indicating that the immiscibility between the two metals is not essential.