0000000000881161
AUTHOR
Antoine Seyeux
showing 5 related works from this author
Influence of post-treatment time of trivalent chromium protection coating on aluminium alloy 2024-T3 on improved corrosion resistance
2019
Abstract Low corrosion protection performances of Trivalent Chromium Process (TCP) coatings with reference to Chromium Conversion Coatings (CCC) deposited on aluminium alloys can be overcome by application of post-treatment processes. This work shows the effect of post-treatment bath (containing hydrogen peroxide and lanthanum salt) on the chemical composition, structure and the corrosion performances of TCP coating deposited on AA 2024-T3 aluminium alloy. Different times of post-treatment bath were applied on the TCP coating and the samples were analyzed by Time-of-Flight Secondary Ion Mass Spectrometry (ToF-SIMS), X-ray Photoelectron Spectroscopy (XPS) and Glow Discharge-Optical Emission …
Corrosion Protection of Steel with Oxide Nanolaminates Grown by Atomic Layer Deposition
2011
Atomic layer deposited (ALD) aluminum and tantalum oxide (Al 2 O 3 and Ta 2 O 5 ) and their nanolaminates were applied as corrosion protection coatings on AISI 52100 steel. The aim was to combine the good sealing properties of Al 2 O 3 with the chemical stability of Ta 2 O 5 and to optimize the coating architecture in order to obtain the best possible long-term durability. Coating composition and morphology were studied with time-of-flight elastic recoil detection analysis (ToF-ERDA), time-of-flight secondary ion mass spectrometry (ToF-SIMS) and field emission scanning electron microscopy (FESEM) and energy dispersive x-ray spectrometry (EDS). Electrochemical properties were studied with vo…
Effect of High Temperature Oxidation Process on Corrosion Resistance of Bright Annealed Ferritic Stainless Steel
2017
The corrosion resistance of stainless steels is determined by the thickness, structure, composition and electronic properties of the oxide layers grown on their surface and isolating the metallic substrate from the environment. In the present work, ex situ XPS (X-Ray Photoelectron Spectroscopy) and ToF-SIMS (Time of Flight Secondary Ions Mass Spectrometry) have been combined to in situ PCS (PhotoCurrent Spectroscopy) in order to perform an integrated physicochemical characterization of surface oxide films grown on bright annealed ferritic stainless steel (AISI 434) as-received and after thermal post-treatment in air. The surface oxide film on as-received samples has a bilayer structure with…
Passivation-Induced Physicochemical Alterations of the Native Surface Oxide Film on 316L Austenitic Stainless Steel
2019
Time of Flight Secondary Ion Mass Spectroscopy, X-Ray Photoelectron Spectroscopy, in situ Photo-Current Spectroscopy and electrochemical analysis were combined to characterize the physicochemical alterations induced by electrochemical passivation of the surface oxide film providing corrosion resistance to 316L stainless steel. The as-prepared surface is covered by a ~2 nm thick, mixed (Cr(III)-Fe(III)) and bi-layered hydroxylated oxide. The inner layer is highly enriched in Cr(III) and the outer layer less so. Molybdenum is concentrated, mostly as Mo(VI), in the outer layer. Nickel is only present at trace level. These inner and outer layers have band gap values of 3.0 and 2.6-2.7 eV, respe…
Modeling of Growth and Dissolution of Nanotubular Titania in Fluoride-Containing Electrolytes
2009
In this paper, model calculations of diffusion processes and pH profiles inside TiO 2 nanotubes are performed in order to explore key factors in the growth mechanism of this system in aqueous electrolytes. An electrochemical steady state featured by an equivalent rate between oxide growth and dissolution is reached for a given current efficiency. Electrochemical oxide growth is found to be exclusively located at the pore bottom, whereas chemical oxide dissolution is uniformly distributed over the whole nanotube. It can be deduced from the results that electrolyte resistance or diffusion processes in the electrolyte inside the tubes are not limiting.