Synthesis of nanostructured amorphous carbon-copper composite films by plasma-enhanced chemical vapour deposition

Abstract Nanostructured amorphous carbon-copper composite films were formed by plasma-enhanced chemical vapour deposition. The formation was done on copper-silicon substrates at 25 °C, 300 °C, 520 °C, and 700 °C temperatures using an acetylene gas at 40–70 Pa pressure. The heating of the Cu Si substrate induced formation of Cu nanospheres with 50–500 nm size depending on the substrate temperature. The microstructure and composition of nanostructured carbon-copper composite films were investigated. The SEM views showed formation of amorphous carbon films with the randomly distributed nanostructures. The oxygen concentration in the composite films decreased with the increased heating temperat…