0000000001040226
AUTHOR
M. Paalanen
showing 2 related works from this author
Economical device for measuring thickness of a thin polymer film
1994
An inexpensive device (about $2K) for thickness measurements of thin (<1 μm) polymer films has been constructed. The homogeneous film is placed on a bulk substrate and three semiconductor lasers of different wavelengths are used to measure the reflectances at normal incidence. The thickness can be deduced with typically 4–8 nm uncertainty.
Nano-lithography by electron exposure using an Atomic Force Microscope
1999
Abstract We have used a conductive Atomic Force Microscope (AFM) tip to expose a very thin resist film. An exposing current of low energy electrons was induced from the tip to the substrate by applying a small bias voltage. Uniform resist films as thin as 10 nm were fabricated using the Langmuir–Blodgett technique. To orient the defined pattern and to make electrical connections a special larger scale alignment structure was first defined by conventional electron beam lithography, either directly in the Langmuir–Blodgett resist film or in a separate first lift-off process with a thicker resist. The results from the one resist process gave conducting 50 nm lines with a 60 A thick vacuum depo…