0000000001123810

AUTHOR

Frank Hamelmann

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Photoemission microscopy with microspot-XPS by use of undulator radiation and a high-throughput multilayer monochromator at BESSY

1999

We present a new experiment for photoelectron microspectroscopy by use of undulator radiation, which has been set up at the beamline U2 at the Berlin electron storage ring BESSY 1. This approach employs a non-imaging simulated hemispherical electron energy analyser attached to an imaging photoemission electron microscope (FOCUS IS-PEEM) with integrated microarea selector. The photoemission microscope exhibits a lateral resolution of 25 nm (with 4.9 eV UV-excitation), while the resolution with incident synchrotron radiation in the soft X-ray range is about 100-120 nm (mainly due to chromatic aberrations). Photoemission microscopy as well as photoelectron microspectroscopy of selected areas o…

RadiationMaterials scienceMicroscopeEUV multilayer opticsbusiness.industryExtreme ultraviolet lithographySynchrotron radiationUndulatorGratingCondensed Matter Physicsmicroarea XPSAtomic and Molecular Physics and Opticsphotoemission microscopyElectronic Optical and Magnetic Materialslaw.inventionOpticsX-ray photoelectron spectroscopylawBlazed gratingPhysical and Theoretical ChemistrybusinessSpectroscopyMonochromator
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