0000000001229027

AUTHOR

Mircea Guina

showing 2 related works from this author

Variation of lattice constant and cluster formation in GaAsBi

2013

We investigate the structural properties of GaAsBi layers grown by molecular beam epitaxy on GaAs at substrate temperatures between 220–315 C. Irrespective of the growth temperature, the structures exhibited similar Bi compositions, and good overall crystal quality as deduced from X-Ray diffraction measurements. After thermal annealing at temperatures as low as 500 C, the GaAsBi layers grown at the lowest temperatures exhibited a significant reduction of the lattice constant. The lattice variation was significantly larger for Bi-containing samples than for Bi-free low-temperature GaAs samples grown as a reference. Rutherford backscattering spectrometry gave no evidence of Bi diffusing out o…

Materials scienceta114Annealing (metallurgy)Analytical chemistryGeneral Physics and Astronomyion beam analysisoptoelektroniikkaRutherford backscattering spectrometryCrystallographic defectCrystalLattice constantTransmission electron microscopyX-ray crystallographyMolecular beam epitaxyJournal of Applied Physics
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Oxidation-Induced Changes in the ALD-Al2O3/InAs(100) Interface and Control of the Changes for Device Processing

2018

InAs crystals are emerging materials for various devices like radio frequency transistors and infrared sensors. Control of oxidation-induced changes is essential for decreasing amounts of the harmful InAs surface (or interface) defects because it is hard to avoid the energetically favored oxidation of InAs surface parts in device processing. We have characterized atomic-layer-deposition (ALD) grown Al2O3/InAs interfaces, preoxidized differently, with synchrotron hard X-ray photoelectron spectroscopy (HAXPES), low-energy electron diffraction, scanning tunneling microscopy, and time-of-flight elastic recoil detection analysis. The chemical environment and core-level shifts are clarified for w…

hapetusMaterials science02 engineering and technologyHigh-electron-mobility transistor01 natural sciences114 Physical scienceslaw.inventionAtomic layer depositionX-ray photoelectron spectroscopyInAslawsynchrotron0103 physical sciencesGeneral Materials Science010302 applied physicsta114business.industryDangling bondatomikerroskasvatus021001 nanoscience & nanotechnologyIII-V semiconductorCrystallographic defectElastic recoil detectionoxidation (active)Electron diffractionatomic layer depositionOptoelectronicsScanning tunneling microscope0210 nano-technologybusinessphotoelectron
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