6533b7d1fe1ef96bd125d5cd
RESEARCH PRODUCT
Soft X-ray photoelectron microscopy used for the characterization of diamond, a-C and CN , thin films
M. NeuhäuserGerd SchönhenseCh. ZiethenR. OhrH. HilgersFrederik Wegelinsubject
Materials scienceMechanical EngineeringAnalytical chemistryDiamondchemistry.chemical_elementGeneral ChemistryChemical vapor depositionengineering.materialElectron spectroscopyXANESElectronic Optical and Magnetic MaterialsPhotoemission electron microscopyCarbon filmchemistryMaterials ChemistryengineeringElectrical and Electronic EngineeringThin filmCarbondescription
Abstract This article gives an overview about the application of X-ray photoemission electron microscopy (X-PEEM) used for the analysis of carbon thin films. We present the results of an X-ray absorption near edge structure (XANES) study of CVD diamond, a-C and CNx films on Si (100) as well as a defect analysis of a hard disc scratch test. The sp2/sp3 ratio of the carbon films was determined and mapped in the electron micrographs, which show localized defects in the surface.
| year | journal | country | edition | language |
|---|---|---|---|---|
| 2002-03-01 | Diamond and Related Materials |