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RESEARCH PRODUCT
Plasma Etching and Integration with Nanoprocessing
Antti NuottajärviTarmo Suppulasubject
Glow dischargeMaterials scienceFabricationPlasma etchingfungitechnology industry and agricultureNanotechnologymacromolecular substancesPlasmastomatognathic systemEtching (microfabrication)parasitic diseasesDry etchingReactive-ion etchingPlasma processingdescription
This chapter introduces plasma etching—an extensive and perhaps the most widely used micro- and nanoprocessing method both in industry and in research and development laboratories worldwide. The emphasis is on the practical methods in plasma etching and reactive ion etching when used for submicron and nanoscale device fabrication. The principles of plasma etching and reactive ion etching equipment for sample fabrication will be introduced.
| year | journal | country | edition | language |
|---|---|---|---|---|
| 2009-01-01 |