6533b7d5fe1ef96bd1263b64

RESEARCH PRODUCT

Fabrication and characterization of chromium based single-electron transistors with evaporated chromium oxide barrier tunnel junctions

Yu. A. PashkinJukka P. PekolaLeonid Kuzmin

subject

Materials scienceFabricationChromium Compoundsbusiness.industryBilayerGeneral Engineeringchemistry.chemical_elementNanotechnologyEvaporation (deposition)ChromiumResistchemistryOptoelectronicsbusinessLithographyElectron-beam lithography

description

We fabricated chromium based single-electron transistors comprising small-area Cr/CrOx/Cr tunnel junctions with an evaporated chromium oxide barrier. The transistors are fabricated using e-beam lithography with a bilayer resist and two-angle shadow evaporation. We describe the fabrication process and discuss the device characteristics.

https://doi.org/10.1116/1.590769