6533b7d7fe1ef96bd1268693
RESEARCH PRODUCT
Niobium Nitride Thin Films for Very Low Temperature Resistive Thermometry
Benjamin A. PiotMathieu GibertAdib TavakoliEddy CollinAki RuhtinasRahul SwamiPablo Garcia-camposJeremy GradelSébastien TriqueneauxKlaus HasselbachOlivier BourgeoisAviad FrydmanTuyen Nguyensubject
Niobium nitrideMaterials scienceFOS: Physical sciencesApplied Physics (physics.app-ph)02 engineering and technology7. Clean energy01 natural scienceschemistry.chemical_compoundMesoscale and Nanoscale Physics (cond-mat.mes-hall)0103 physical sciencesGeneral Materials ScienceThin film010306 general physicsNanoscopic scaleElectrical impedance[PHYS.COND.CM-MSQHE]Physics [physics]/Condensed Matter [cond-mat]/Mesoscopic Systems and Quantum Hall Effect [cond-mat.mes-hall]Resistive touchscreenCondensed Matter - Mesoscale and Nanoscale Physicsbusiness.industryPhysics - Applied Physics021001 nanoscience & nanotechnologyCondensed Matter PhysicsAtomic and Molecular Physics and OpticsMagnetic fieldchemistryThermometerOptoelectronics0210 nano-technologybusinessTemperature coefficientdescription
We investigate thin film resistive thermometry based on metal-to-insulator-transition (niobium nitride) materials down to very low temperature. The variation of the NbN thermometer resistance have been calibrated versus temperature and magnetic field. High sensitivity in tempertaure variation detection is demonstrated through efficient temperature coefficient of resistance. The nitrogen content of the niobium nitride thin films can be tuned to adjust the optimal working temperature range. In the present experiment, we show the versatility of the NbN thin film technology through applications in very different low temperature use-cases. We demonstrate that thin film resistive thermometry can be extended to temperatures below 30 mK with low electrical impedance.
| year | journal | country | edition | language |
|---|---|---|---|---|
| 2019-07-24 | Journal of Low Temperature Physics |