6533b7d9fe1ef96bd126c0a9
RESEARCH PRODUCT
Numerical study of photolithography system: electromagnetic differential method
J. P. DufourH. AouragL. SalomonSouraya Goumri-saidSouraya Goumri-saidsubject
Work (thermodynamics)business.industryMetals and AlloysIndustrial and Manufacturing EngineeringComputer Science ApplicationsPower (physics)law.inventionOpticsAmplitudelawAperiodic graphModeling and SimulationCeramics and CompositesPhotolithographybusinessRefractive indexGroove (music)MathematicsIncidence (geometry)description
The R-matrix propagation algorithm is incorporated into the differential method to achieve an extended capability for modelling a photolithography systems. We show throughout this work the ability of the R-matrix algorithm and differential method to analyse gratings of arbitrary depth, profile, and conductivity without encountering numerical instabilities. We calculate the field intensity and the transmitted amplitudes in the 0 and −1 orders below different masks. We study also the influence of the various parameters (incidence, groove spacing, groove depth and index of refraction) on the field intensity maps and the transmittivity power. These results agree with the experimental patent: we can duplicate the periodic masks as well as aperiodic masks. © 2004 Elsevier B.V. All rights reserved.
| year | journal | country | edition | language |
|---|---|---|---|---|
| 2004-05-01 | Journal of Materials Processing Technology |