6533b7d9fe1ef96bd126ca4b
RESEARCH PRODUCT
Creating Defined 3-D Defects Inside an Opaline Ormocer® Matrix with Two-Photon Lithography
Christopher K. OberRudolf ZentelLorenz SteidlLorenz SteidlShalin J. JhaveriBirger LangeRamakrishnan Ayothisubject
Materials sciencePolymers and PlasticsBand gapbusiness.industryReplicaOrganic ChemistryMultiphoton lithographylaw.inventionWavelengthOpticslawMaterials ChemistryPhotolithographybusinessLithographyRefractive indexPhotonic crystaldescription
The creation of defined structures inside a synthetic opal is a key step toward applications in optics, where control of the propagation of light inside a photonic crystal is necessary. In a previous paper, we described the nanostructuring of Ormocer® to form inverse opals (Lange et al., Macromol. Rapid Commun. 2006, 27, 1746). Here, we report an application for this robust replica process in which defects can be directly produced within the PC by two-photon lithography. The holes of an inverse opal structure are first filled with a resin of similar refractive index. In this transparent material, polymerization can be initiated at defined places via two-photon lithography. After removal of the unpolymerized resin, buried fluorescent defects of dimensions comparable to the repeating units of the replica are found. The wavelength of their emission can be adjusted to the band gap of the replica.
| year | journal | country | edition | language |
|---|---|---|---|---|
| 2007-04-16 | Macromolecular Rapid Communications |