6533b7dafe1ef96bd126e280

RESEARCH PRODUCT

Interdependence of structural and electrical properties in tantalum/tantalum oxide multilayers

Luc ImhoffValérie PotinNicolas MartinStéphane LoffredoArnaud Cacucci

subject

Materials scienceInorganic chemistryOxideTantalumchemistry.chemical_element02 engineering and technology01 natural scienceschemistry.chemical_compoundCrystallinityVan der Pauw methodSputtering0103 physical sciencesMaterials Chemistry[SPI.NANO]Engineering Sciences [physics]/Micro and nanotechnologies/MicroelectronicsThin filmDeposition (law)010302 applied physicsSurfaces and InterfacesGeneral Chemistry021001 nanoscience & nanotechnologyCondensed Matter PhysicsSurfaces Coatings and FilmschemistryChemical engineeringTransmission electron microscopy[ SPI.NANO ] Engineering Sciences [physics]/Micro and nanotechnologies/Microelectronics0210 nano-technology

description

International audience; Dc reactive sputtering was used to deposit tantalum metal/oxide periodic nanometric multilayers using the innovative technique namely, the reactive gas pulsing process (RGPP). Different pulsing periods were used for each deposition to produce metal-oxide periodic alternations included between 5 and 80 nm. Structure, crystallinity and chemical composition of these films were systematically investigated by Transmission Electron Microscopy (TEM) and Energy-dispersive X-ray (EDX) spectroscopy techniques. Moreover, electrical properties were also studied by the Van der Pauw technique.

yearjournalcountryeditionlanguage
2013-07-01Surface and Coatings Technology
https://doi.org/10.1016/j.surfcoat.2012.10.064