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RESEARCH PRODUCT
<title>Amorphous chalcogenide semiconductor resists for holography and electron-beam lithography</title>
Janis TeterisIlona Kuzminasubject
Materials sciencebusiness.industryChalcogenideHolographylaw.inventionInterference lithographyAmorphous solidchemistry.chemical_compoundSemiconductorOpticschemistryResistlawX-ray lithographybusinessElectron-beam lithographydescription
The photo- and electron beam induced changes in solubility of amorphous chalcogenide semiconductor As-S-Se and As2S3 thin films have been studied. The possibilities of practical application of these materials as resists for the production of relief holograms and holographic optical elements are discussed. It is shown that the self-enhancement phenomenon of holographic recording in amorphous chalcogenide semiconductor films by light or thermal treatment can be used to increase the diffraction efficiency of the holograms.© (2001) COPYRIGHT SPIE--The International Society for Optical Engineering. Downloading of the abstract is permitted for personal use only.
| year | journal | country | edition | language |
|---|---|---|---|---|
| 2001-04-10 | Optical Organic and Inorganic Materials |