6533b81ffe1ef96bd1277e03
RESEARCH PRODUCT
Hydrogen plasma induced photoelectron emission from low work function cesium covered metal surfaces
S. AleiferisOlli TarvainenRisto KronholmJanne LaulainenTaneli KalvasHannu Koivistosubject
010302 applied physicsPhysicsta114HydrogenTantalumAnalytical chemistrytransitionchemistry.chemical_elementSubstrate (electronics)plasmasCondensed Matter Physics01 natural sciencesIon sourcework functions010305 fluids & plasmasion sourceschemistryAluminiumCaesium0103 physical sciencesWork functionLayer (electronics)photoemissiondescription
Experimental results of hydrogen plasma induced photoelectron emission from cesium covered metal surfaces under ion source relevant conditions are reported. The transient photoelectron current during the Cs deposition process is measured from Mo, Al, Cu, Ta, Y, Ni, and stainless steel (SAE 304) surfaces. The photoelectron emission is 2–3.5 times higher at optimal Cs layer thickness in comparison to the clean substrate material. Emission from the thick layer of Cs is found to be 60%–80% lower than the emission from clean substrates. peerReviewed
| year | journal | country | edition | language |
|---|---|---|---|---|
| 2017-10-01 | Physics of Plasmas |