6533b821fe1ef96bd127ac1e
RESEARCH PRODUCT
Cooling of the plasma chamber for the AECR-U type electron cyclotron resonance ion source ARTEMIS
H. KoivistoAl ZellerJ.c. Dekampsubject
Nuclear and High Energy PhysicsReliability (semiconductor)Field (physics)Physics::Plasma PhysicsChemistryMagnetElectrodePlasmaAtomic physicsInstrumentationIon sourceElectron cyclotron resonanceIondescription
Abstract The temperature distribution inside the ECRIS plasma chamber has been studied using finite element analysis. The main goal of these studies was to find out the safest cooling design for the temperature sensitive permanent magnets. In ECR ion sources they are used to provide the hexapole field. Two different designs for the cooling of the magnets were investigated. The temperature distribution on the surface of the plasma electrode was also studied. With the aid of the cooling simulations the most efficient cooling for the new ECR ion source was found. As a result of which, safety and higher reliability of operation can be reached.
| year | journal | country | edition | language |
|---|---|---|---|---|
| 2001-04-01 | Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms |