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RESEARCH PRODUCT
Non-ionic photo-acid generators for applications in two-photon lithography
Sin Yee Cindy NgWarren R. ZipfelRamakrishnan AyothiJing ShaShalin J. JhaveriChristopher K. OberJesse D. McmullenRudolf ZentelLorenz SteidlLorenz Steidlsubject
IsopropylthioxanthoneMaterials scienceCationic polymerizationGeneral ChemistryPhotochemistryMultiphoton lithographychemistry.chemical_compoundResistPolymerizationchemistryMaterials ChemistryTrifluoromethanesulfonateLithographyPhotoinitiatordescription
Non-ionic photoacid generators (PAGs) have been designed and synthesized for use in two-photon lithography (TPL). The chromophores in these new PAGs are covalently linked to the photocleavable group by a flexible joint. Their thermal stability, solubility and efficiency to produce acid under both one- and two-photon excitation were characterized. The potential of these PAGs for TPL was tested in two negative-tone resist systems relying on different mechanisms: free-radical/cationic polymerization or a cationically initiated cross-linking reaction. These PAGs needed lower threshold power for polymerization compared to a commercially available photoinitiator, isopropylthioxanthone, and a photoacid generator, N-hydroxynaphthalimide triflate. Microstructures with a resolution of 0.6 µm were fabricated and the threshold power for polymerization was found to be below 2 mW.
| year | journal | country | edition | language |
|---|---|---|---|---|
| 2009-01-01 | J. Mater. Chem. |