6533b824fe1ef96bd128088f
RESEARCH PRODUCT
A new plasma potential measurement instrument for plasma ion sources
P. SuominenH. KoivistoOlli Tarvainensubject
Physicsbusiness.industryPlasmaElectron cyclotron resonanceIon sourceIonOpticsBeamlineElectrodePlasma diagnosticsAtomic physicsbusinessInstrumentationVoltagedescription
A very efficient and fast instrument to measure the plasma potential of ion sources has been developed at the Department of Physics, University of Jyvaskyla (JYFL). The operating principle of this novel instrument is to apply a decelerating voltage into a mesh located in the beamline of the ion source. The plasma potential is determined by measuring the current at the grounded electrode situated behind the mesh as a function of the voltage. In this article, we will introduce the instrument and the first results. In the experiments, the instrument was connected to the beamline of the JYFL 6.4 GHz electron cyclotron resonance ion source. The plasma potential was measured with different source conditions and it was observed to vary between 30–65 V. The plasma potential tended to increase as the microwave power, or the gas feed rate, was increased. These results are consistent with earlier observations and estimations. It was also noticed that the value of the plasma potential changed when the negative voltag...
| year | journal | country | edition | language |
|---|---|---|---|---|
| 2004-09-20 | Review of Scientific Instruments |