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RESEARCH PRODUCT
Au-PVA Nanocomposite Negative Resist for One-Step Three-Dimensional e-Beam Lithography
Josep Canet-ferrerJ. L. ValdesJose Marques-huesoJuan P. Martínez-pastorRafael AbarguesSaid Agouramsubject
NanocompositeMaterials sciencebusiness.industrySurface plasmonSurfaces and InterfacesPhotoresistCondensed Matter PhysicsOpticsChemical engineeringResistTransmission electron microscopyElectrochemistryGeneral Materials ScienceSurface plasmon resonancebusinessLithographySpectroscopyElectron-beam lithographydescription
Au nanoparticles are synthesized in situ upon the electron beam exposure of a poly(vinyl alcohol) (PVA) thin film containing Au(III). The e-beam-irradiated areas are insoluble in water (negative-tone resist), and Au-PVA nanocomposite patterns with a variable profile along the structure can be thus generated (3D lithography) in a single step. A local characterization of the generated patterns is performed by high-resolution transmission electron microscopy and UV-vis localized surface plasmon resonance microspectroscopy. This characterization confirms the presence of crystalline nanoparticles and aggregates.
| year | journal | country | edition | language |
|---|---|---|---|---|
| 2009-11-02 | Langmuir |