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RESEARCH PRODUCT
Resist Coating of Cylindrical Samples for 3‐D Lithography
C. ArnoneG. GrassoC. Giaconiasubject
Resist coating 3-D Lithography Laser writingMaterials sciencebusiness.industryThin layerengineering.materialCondensed Matter PhysicsSettore ING-INF/01 - ElettronicaAtomic and Molecular Physics and OpticsSurfaces Coatings and FilmsElectronic Optical and Magnetic MaterialsLaser linewidthOpticsCoatingResistengineeringElectrical and Electronic EngineeringbusinessLithographydescription
A quantitative investigation of a dipping technique for depositing a thin layer of resist on circularly symmetrical objects is presented. The results obtained are valuable for preparing three-dimensional (3-D) surfaces suited for spatial microlithographic processes in the 1 to 10 μm linewidth range. © 1995, MCB UP Limited
| year | journal | country | edition | language |
|---|---|---|---|---|
| 1995-01-01 | Microelectronics International |