6533b827fe1ef96bd1285a6d
RESEARCH PRODUCT
MOCVD deposition of YSZ on stainless steels
Günter BorchardtSébastien ChevalierMartin KiloJ. P. Larpinsubject
ZirconiumMaterials scienceMetallurgyAnalytical chemistryGeneral Physics and Astronomychemistry.chemical_elementSurfaces and InterfacesGeneral ChemistryChemical vapor depositionYttriumAtmospheric temperature rangeCondensed Matter PhysicsSurfaces Coatings and FilmsTetragonal crystal systemchemistryCubic zirconiaMetalorganic vapour phase epitaxyYttria-stabilized zirconiadescription
Abstract Yttria stabilized zirconia was deposited on stainless steel using the metal–organic chemical vapor deposition (MOCVD) technique, from β-diketonate precursors. The variation of the evaporation temperatures of yttrium and zirconium precursor allowed to control the level of Y within the film. Over the temperature range 125–150 °C, the Y content increased from 2.5 to 17.6 at.%. X-ray diffraction (XRD) analyses evidenced tetragonal phase of zirconia when the Y content was below 8 at.%, and cubic phase for higher concentration. Sputtered neutral mass spectrometry (SNMS) profiles confirmed that the control and stability of Y precursor temperature were of major importance to guarantee the homogeneity of the deposited films.
| year | journal | country | edition | language |
|---|---|---|---|---|
| 2003-01-01 | Applied Surface Science |