6533b82afe1ef96bd128c079
RESEARCH PRODUCT
Elektronenmikroskopische Untersuchung von Transversalschnitten d�nner Schichten auf festen Unterlagen
H. SchröderH. Bachsubject
Nuclear and High Energy PhysicsOptical filmTransverse planeMaterials scienceEtching (microfabrication)Transmission electron micrographfungiNuclear fusionComposite materialThin filmTotal thicknessIondescription
A method is described which allows to prepare transverse sections of thin films by means of an ion etching technique so that transmission electron micrographs of the film structure can be carried out. A section through a 6-layered optical film with a total thickness of 0.62 μm is shown as an example.
| year | journal | country | edition | language |
|---|---|---|---|---|
| 1969-02-01 | Zeitschrift f�r Physik |