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RESEARCH PRODUCT

Co-doping with boron and nitrogen impurities in T-carbon

Zhen-wei TianXiao-qian CuiLi JinRoberts I. EglitisMu-chen CuiJia-kun TianRan JiaRan Jia

subject

Materials science010405 organic chemistryBand gapDopingT-carbonchemistry.chemical_elementGeneral Chemistry010402 general chemistryDFT01 natural sciencesNitrogen0104 chemical scienceslcsh:Chemistrylcsh:QD1-999chemistryImpurityLattice (order)AtomThermoelectric effect:NATURAL SCIENCES:Physics [Research Subject Categories]DopingPhysical chemistryBN pairBoron

description

Previously, Ren et al. [Chem. Phys. 518, 69–73, 2019] reported the failure of Boron-Nitrogen (B-N) co-doping as inter B-N bond in T-carbon. In present work, a B-N atom pair is introduced in T-carbon as p-n co-dopant to substitute two carbon atoms in the same carbon tetrahedron and form an intra B-N bond. The stability of this doping system is verified from energy, lattice dynamic, and thermodynamic aspects. According to our B3PW calculations, B-N impurities in this situation can reduce the band gap of T-carbon from 2.95 eV to 2.55 eV, making this material to be a promising photocatalyst. Through the study of its transport properties, we can also conclude that B-N co-doping cannot improve the thermoelectric performance of T-carbon.

10.1016/j.jscs.2020.09.002http://dx.doi.org/10.1016/j.jscs.2020.09.002