6533b831fe1ef96bd1299876

RESEARCH PRODUCT

ZnS Ultrathin interfacial layers for optimizing carrier management in Sb2S3-based photovoltaics

Dirk DöhlerJulien BachmannJulien BachmannTadahiro YokosawaErdmann SpieckerIgnacio Mínguez-bachoPablo P. BoixElizabeth R. YoungPascal BüttnerCraig A. PointerFlorian SchelerFlorian Scheler

subject

Materials sciencechemistry.chemical_elementanti-recombination layer02 engineering and technology010402 general chemistry7. Clean energy01 natural sciencesAtomic layer depositionAntimonyPhotovoltaicsinterfacial layerGeneral Materials Sciencepassivation layerÒxidsMaterialsCèl·lules fotoelèctriquesextremely thin absorberthin film solar cellsintegumentary systemLow toxicitybusiness.industrytunnel barrierfood and beverages021001 nanoscience & nanotechnology0104 chemical sciencesTunnel barrierchemistrybiological sciencesatomic layer depositionSolar energy conversionOptoelectronicschalcogenidesThin film solar cell0210 nano-technologybusinessResearch Article

description

Antimony chalcogenides represent a family of materials of low toxicity and relative abundance, with a high potential for future sustainable solar energy conversion technology. However, solar cells based on antimony chalcogenides present open-circuit voltage losses that limit their efficiencies. These losses are attributed to several recombination mechanisms, with interfacial recombination being considered as one of the dominant processes. In this work, we exploit atomic layer deposition (ALD) to grow a series of ultrathin ZnS interfacial layers at the TiO2/Sb2S3 interface to mitigate interfacial recombination and to increase the carrier lifetime. ALD allows for very accurate control over the ZnS interlayer thickness on the ångström scale (0-1.5 nm) and to deposit highly pure Sb2S3. Our systematic study of the photovoltaic and optoelectronic properties of these devices by impedance spectroscopy and transient absorption concludes that the optimum ZnS interlayer thickness of 1.0 nm achieves the best balance between the beneficial effect of an increased recombination resistance at the interface and the deleterious barrier behavior of the wide-bandgap semiconductor ZnS. This optimization allows us to reach an overall power conversion efficiency of 5.09% in planar configuration.

10.1021/acsami.0c21365https://hdl.handle.net/10550/82706