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RESEARCH PRODUCT
Structural organization of silanol and silicon hydride groups in the amorphous silicon dioxide network
Gianpiero BuscarinoRoberto BoscainoEleonora VellaG. Vaccarosubject
Materials sciencesilica glass sio2 silanol groups silicon hydride groupsSiliconHydrideAnnealing (metallurgy)chemistry.chemical_elementCondensed Matter PhysicThermal treatmentCondensed Matter PhysicsElectronic Optical and Magnetic MaterialsAmorphous solidsymbols.namesakeSilanolchemistry.chemical_compoundchemistryAbsorption bandsymbolsPhysical chemistryRaman spectroscopydescription
We present a study on the effects of an isothermal annealing treatment on a-SiO 2 having a significant content of silanol hydride groups (Si-H). We examined the properties of the IR absorption bands of silanol (Si-OH) and silicon hydride groups as a function of the duration of the thermal treatment. We showed that the Si-OH and Si-H groups contents decrease in a linearly correlated way. The annealing dynamics suggest that the two species are close to each other in the amorphous network. We showed that the profile of the silanol groups absorption band is the same as that observed in other commercial a-SiO 2 materials, irrespectively of the concomitant presence of nearby Si-H groups, and, moreover, it does not change during the annealing treatment. This set of evidences supports the conclusion that silanol groups are organized in clusters in the a-SiO 2 network. Finally, present data provide an unprecedented characterization of the Si-H IR absorption band. It results that the profiles of the IR and Raman activities of silicon hydride groups closely coincide. © 2011 EDP Sciences, SIF, Springer-Verlag Berlin Heidelberg.
| year | journal | country | edition | language |
|---|---|---|---|---|
| 2011-09-01 | The European Physical Journal B |