6533b834fe1ef96bd129d3f7
RESEARCH PRODUCT
Floating Zone Growth of Silicon
Anke LüdgeNico WernerJanis VirbulisA. MuiznieksA. MuiznieksHelge Riemannsubject
Materials scienceSiliconbusiness.industryCapillary actionchemistry.chemical_elementRodStress (mechanics)Induction coilchemistryElectromagnetic coilElectronic engineeringOptoelectronicsProcess controlLaser-heated pedestal growthbusinessdescription
Abstract The floating zone (FZ) technique changed from a crucible-free purification method into a growth technique mainly for high purity silicon crystals. The melt zone is inductively heated by the high frequency magnetic field of a sophisticated one-turn induction coil being the heart of the FZ growth. The needle-eye technique allows for crystals with large diameters beyond the capillary limitations of a cylindrical zone, but both electric breakthrough at the coil slit and bursting of the crystal by thermomechanical stress presently limit the diameter to 200 mm. A novel gFZ concept is depicted that works with granular silicon feedstock instead of expensive feed rods. The automation of the industrial FZ silicon growth is a key issue regarding yield, reproducibility, quality, and economization. A model-based, predictive control system of the FZ growth is presented. For state-of-the-art development and to overcome the process barriers, a detailed multiphysical numerical modeling of the FZ process is required and outlined.
| year | journal | country | edition | language |
|---|---|---|---|---|
| 2015-01-01 |