6533b837fe1ef96bd12a1e55

RESEARCH PRODUCT

Reexamining Different Factors of the Resonance-Enhanced High-Order Harmonic Generation in Atomic and Nanoparticle Laser-Induced Tin Plasmas

Hiroto KurodaRashid A. Ganeev

subject

Materials science01 natural scienceslcsh:TechnologyIonlaw.invention010309 opticslcsh:Chemistryresonance enhancement of harmonicslaw0103 physical sciencesHigh harmonic generationGeneral Materials Science010306 general physicsInstrumentationlcsh:QH301-705.5Fluid Flow and Transfer Processeshigh-order harmonic generationlcsh:TProcess Chemistry and TechnologyGeneral EngineeringResonancetin plasmaPlasmaLaserlcsh:QC1-999Computer Science Applicationslcsh:Biology (General)lcsh:QD1-999lcsh:TA1-2040HarmonicsHarmonicnanoparticlesAtomic physicslcsh:Engineering (General). Civil engineering (General)Ultrashort pulselcsh:Physics

description

We reexamine the resonance enhancement of a single harmonic emission during the propagation of ultrafast pulses through atomic and nanoparticle tin-containing laser-induced plasma (LIP). We compare the single atomic Sn and Sn nanoparticle plasmas to demonstrate a distinction in the enhancement factor of the single harmonic in the case of fixed and tunable near-infrared pulses. The analysis of the dynamics of Sn LIP shows the range of optimal delays between heating and driving pulses (130–180 ns), at which the maximal harmonic yield can be achieved. The enhancements of the 17th and 18th harmonics of 806 nm pulses were analyzed in the case of single-color and two-color pumps of LIP, showing up to a 12-fold enhancement of even harmonics in the two-color pump case. We show the enhancement of a single harmonic in the vicinity of the 4d105s25p2P3/2→4d95s25p2 transitions of Sn II ions and demonstrate how this process depends on the constituency of the plasma components at different conditions of target ablation. The application of tunable (1280–1440 nm) radiation allows for demonstrating the variations of single harmonic enhancement using a two-color pump of Sn-containing LIP.

10.3390/app11052193http://dx.doi.org/10.3390/app11052193