6533b838fe1ef96bd12a4f67

RESEARCH PRODUCT

Quantitative molecular plating of large-area 242Pu targets with improved layer properties

B. CremerCh. E. DüllmannKlaus EberhardtNorbert TrautmannJörg RunkeA. VasconA. Vascon

subject

X-ray spectroscopySurface coatingRadiationMaterials scienceScanning electron microscopeHomogeneity (physics)MicroscopyAnalytical chemistryWaferSpectroscopyCurrent density

description

Abstract For measurements of the neutron-induced fission cross section of 242Pu, large-area (42 cm2) 242Pu targets were prepared on Ti-coated Si wafers by means of constant current density molecular plating. Radiochemical separations were performed prior to the platings. Quantitative deposition yields (>95%) were determined for all targets by means of alpha-particle spectroscopy. Layer densities in the range of 100–150 μg/cm2 were obtained. The homogeneity of the targets was studied by radiographic imaging. A comparative study between the quality of the layers produced on the Ti-coated Si wafers and the quality of layers grown on normal Ti foils was carried out by applying scanning electron microscopy and energy dispersive X-ray spectroscopy. Ti-coated Si wafers resulted clearly superior to Ti foils in the production of homogeneous 242Pu layers with minimum defectivity.

yearjournalcountryeditionlanguage
2015-01-01Applied Radiation and Isotopes
https://doi.org/10.1016/j.apradiso.2014.10.002