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RESEARCH PRODUCT
Very strong −N–X+⋯−O–N+ halogen bonds
Kari RissanenSandip BhowmikOndřej JurčekRakesh PuttreddyToni Mäkeläsubject
halogen bondsNanotechnologychemistry010402 general chemistry01 natural sciencesCatalysisoxygen atomMaterials Chemistryta116Halogen bond010405 organic chemistryChemistryHydrogen bondMetals and AlloysGeneral ChemistryAcceptor0104 chemical sciencesSurfaces Coatings and FilmsElectronic Optical and Magnetic MaterialsCrystallographyOxygen atomHalogenCeramics and CompositesProton NMRTitrationSingle crystaldescription
A new (-)N-X(+)(-)O-N(+) paradigm for halogen bonding is established by using an oxygen atom as an unusual halogen bond acceptor. The strategy yielded extremely strong halogen bonded complexes with very high association constants characterized in either CDCl3 or acetone-d6 solution by (1)H NMR titrations and in the solid-state by single crystal X-ray analysis. The obtained halogen bond interactions, RXB, in the solid-state are found to be in the order of strong hydrogen bonds, viz. RXB ≈ RHB.
| year | journal | country | edition | language |
|---|---|---|---|---|
| 2016-01-06 | Chemical Communications |