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RESEARCH PRODUCT
Atomic layer deposition and characterization of biocompatible hydroxyapatite thin films
P. RahkilaLeiting XuMatti PutkonenLauri NiinistöHarry J. WhitlowTimo SajavaaraSulin Chengsubject
Materials scienceAnnealing (metallurgy)Borosilicate glassMetals and AlloysMineralogySurfaces and InterfacesSurfaces Coatings and FilmsElectronic Optical and Magnetic MaterialsAmorphous solidchemistry.chemical_compoundAtomic layer depositionCrystallinitychemistryChemical engineeringImpurityMaterials ChemistryPolystyreneThin filmdescription
Abstract Atomic layer deposition (ALD) was used to produce hydroxyapatite from Ca(thd) 2 (thd = 2,2,6,6-tetramethyl-3,5-heptanedionato) and (CH 3 O) 3 PO onto Si(100) and Corning (0211). Film crystallinity, stoichiometry, possible impurities and surface morphology were determined. The as-deposited films contained significant amounts of carbonate impurities however, annealing at moist N 2 flow reduced the carbonate content even at 400 °C. The as-deposited Ca–P–O films were amorphous but rapid thermal annealing promoted the formation of the hydroxyapatite phase. Mouse MC 3T3-E1 cells were used for the cell culture experiments. According to the bioactivity studies cell proliferation was enhanced on as-deposited ALD-grown Ca–P–O films and greatly enhanced on films annealed at 500 °C in comparison with reference cells on borosilicate glass or cell culture polystyrene.
| year | journal | country | edition | language |
|---|---|---|---|---|
| 2009-08-01 |