6533b853fe1ef96bd12abeb7

RESEARCH PRODUCT

Phase mixture in MOCVD and reactive sputtering TiOxNy thin films revealed and quantified by XPS spectra factorial analysis

Jérôme GuillotJean-marie ChappeOlivier HeintzNicolas MartinLuc ImhoffJamal Takadoum

subject

[ SPI.MAT ] Engineering Sciences [physics]/Materials[SPI.MAT] Engineering Sciences [physics]/MaterialsComputingMilieux_MISCELLANEOUS[SPI.MAT]Engineering Sciences [physics]/Materials

description

International audience

https://hal.archives-ouvertes.fr/hal-00267639