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RESEARCH PRODUCT
Re-entrance phase formation of CeSb thin films
Michael HuthH. MeffertJ. OsterH. Adriansubject
Condensed matter physicsChemistryStereochemistryHeterojunctionCondensed Matter PhysicsEpitaxyInstabilityPhase formationFlux ratioInorganic ChemistryMaterials ChemistryGrowth rateThin filmMolecular beam epitaxydescription
Abstract We report the epitaxial growth of (1 0 0)- and (1 1 1)-oriented CeSb thin films on Al 2 O 3 (1 1 2 0) and (0 0 0 1) substrates by means of molecular beam epitaxy. Depending on the overall Sb-to-Ce flux ratio and the molecular state of Sb x , we observe a re-entrance behavior in the phase formation and orientation of CeSb on Al 2 O 3 (1 1 2 0) . This behavior is shown to exhibit, in some respect, similarities to III–V compound growth, but also more complexities due to the instability of the rare earth component against oxidation. A geometric orientation selection model is suggested which reproduces the observed re-entrance behavior as well as the overall CeSb growth rate.
year | journal | country | edition | language |
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2001-09-01 | Journal of Crystal Growth |