Search results for "CMOS"
showing 10 items of 120 documents
Bringing Plasmonics Into CMOS Photonic Foundries: Aluminum Plasmonics on Si$_{3}$N$_{4}$ for Biosensing Applications
2019
We present a technology platform supported by a new process design kit (PDK) that integrates two types of aluminum plasmonic waveguides with Si $_{3}$ N $_{4}$ photonics towards CMOS-compatible plasmo-photonic integrated circuits for sensing applications. More specifically, we demonstrate the fabrication of aluminum slot waveguide via e-beam lithography (EBL) on top of the Si $_{3}$ N $_{4}$ waveguide and an optimized fabrication process of aluminum plasmonic stripe waveguides within a CMOS foundry using EBL. Experimental measurements revealed a propagation length of 6.2 μm for the plasmonic slot waveguide in water at 1550 nm, reporting the first ever experimental demonstration of a plasmon…
CMOS-compatible nanoscale gas-sensor based on field effect
2009
The integration of a solid state gas sensor of the metal oxide sensor type into CMOS technology still is a challenge because of the high temperatures during metal oxide annealing and sensor operation that do not comply with silicon device stability. In the presence of an external electric field sensor sensitivity can be controlled through a change of the Fermi energy level and consequently it is possible to reduce the operation temperature. Based in this effect, a novel field effect gas sensor was developed resembling a reversed insulated : gate field effect transistor (IGFET) with the thickness of gas sensing layer in the range of the Debye length (L D ). Under these conditions the control…
Smart camera design for intensive embedded computing
2005
Computer-assisted vision plays an important role in our society, in various fields such as personal and goods safety, industrial production, telecommunications, robotics, etc. However, technical developments are still rare and slowed down by various factors linked to sensor cost, lack of system flexibility, difficulty of rapidly developing complex and robust applications, and lack of interaction among these systems themselves, or with their environment. This paper describes our proposal for a smart camera with real-time video processing capabilities. A CMOS sensor, processor and, reconfigurable unit associated in the same chip will allow scalability, flexibility, and high performance.
Why Bring Organic and Molecular Electronics to Spintronics
2015
Organic spintronics field is an emerging field at the frontier between organic chemistry and spintronics. Exploiting the peculiarity of these two fields, it combines the flexibility, versatility and low production cost of organic materials with the nonvolatility, spin degree of freedom and beyond CMOS capabilities offered by spintronics. Before starting the discussion on the organic spintronics field, in this chapter will be provided a brief introduction on organic and molecular electronics and the specificities of molecules. This will help to understand the advantages that molecular systems can bring to spintronics.
CMOS-compatible field effect nanoscale gas-sensor: Operation and annealing models
2008
Complete modelling of electrically controlled nanoscale gas sensors with Poisson, Wolkenstein, Fokker-Planck and continuity is presented. Based on a plausible Drift explanation we developed suitable models for sensitivity control and operational modes. An onset for CMOS-complying annealing procedures is given.
Monolithic integration of Giant Magnetoresistance (GMR) devices onto standard processed CMOS dies
2014
Giant Magnetoresistance (GMR) based technology is nowadays the preferred option for low magnetic fields sensing in disciplines such as biotechnology or microelectronics. Their compatibility with standard CMOS processes is currently investigated as a key point for the development of novel applications, requiring compact electronic readout. In this paper, such compatibility has been experimentally studied with two particular non-dedicated CMOS standards: 0.35 μm from AMS (Austria MicroSystems) and 2.5 μm from CNM (Centre Nacional de Microelectrònica, Barcelona) as representative examples. GMR test devices have been designed and fabricated onto processed chips from both technologies. In order …
CMOS Photodiode Design for Gamma Camera Application
2008
We designed new photodiodes sensors including current mirror amplifiers. These photodiodes have been fabricated using a CMOS 0.6 micrometers process from Austria Micro System (AMS). The photodiode areas are respectively 1 mm × 1 mm and 0.4 mm × 0.4 mm with fill factor 98% and total chip area is 2 square millimetres. The sensor pixels show a logarithmic response in illumination and are capable of detecting very low blue light (less than 0.5 lux) . These results allow to use our sensor in new gamma camera solid-state concept.
Polarization insensitive wavelength conversion of 40 Gb/s DPSK signals in a silicon germanium waveguide
2015
We demonstrate polarization insensitive FWM-based wavelength conversion of 40Gb/s DPSK signals in a SiGe waveguide, with 0.42-dB polarization-dependent loss. A 1.5-dB Dower nenaltv was measured at a BER of 10−9.
Recent developments in the manipulation of magnetic domain walls in CoFeB–MgO wires for applications to high-density nonvolatile memories
2015
Abstract The recent discovery that magnetic domain walls can be moved under a small current without any magnetic field opens a perspective for a paradigm shift in mass storage design. However, several fundamental questions must be answered before the technology can be considered feasible. This review covers the current understanding of domain wall (DW) propagation in CoFeB–MgO structures with perpendicular magnetic anisotropy. These films exhibit a very low density of pinning centers and can be integrated in Magnetic Tunnel Junctions, making them very promising for manipulating multiple domain walls in ultra-high-density spintronic devices. Several important issues are addressed: the physic…
Design and operation of CMOS-compatible electron pumps fabricated with optical lithography
2017
We report CMOS-compatible quantized current sources (electron pumps) fabricated with nanowires (NWs) on 300mm SOI wafers. Unlike other Al, GaAs or Si based metallic or semiconductor pumps, the fabrication does not rely on electron-beam lithography. The structure consists of two gates in series on the nanowire and the only difference with the SOI nanowire process lies in long (40nm) nitride spacers. As a result a single, silicide island gets isolated between the gates and transport is dominated by Coulomb blockade at cryogenic temperatures thanks to the small size and therefore capacitance of this island. Operation and performances comparable to devices fabricated using e-beam lithography is…