Search results for "DEP"

showing 10 items of 10555 documents

Atomic Layer Deposition of Aluminum Oxide on TiO2 and Its Impact on N3 Dye Adsorption from First Principles

2011

The atomic layer deposition of aluminum oxide on an OH-terminated TiO2(101) anatase surface was studied employing density functional theory calculations. The formation of the Al2O3−TiO2 interface during the first atomic layer deposition cycle was modeled by studying the dissociative adsorption of an Al(CH3)3 precursor, followed with a H2O-pulse reaction step that changes the surface termination. Calculations provide evidence for the formation of a discontinuous, atomically rough aluminum oxide layer after the first cycle. To explore the role of the aluminum oxide layer on adsorption of a ruthenium-based N3 dye molecule, various adsorption geometries were investigated. Calculations show that…

inorganic chemicalsAnataseMaterials scienceta114Reaction stepInorganic chemistrychemistry.chemical_elementBlock (periodic table)Surfaces Coatings and FilmsElectronic Optical and Magnetic MaterialsRutheniumAtomic layer depositionGeneral EnergyAdsorptionchemistryChemical engineeringDensity functional theoryPhysical and Theoretical ChemistryLayer (electronics)ta116Journal of Physical Chemistry C
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A step forward in the development of superoxide dismutase mimetic nanozymes: the effect of the charge of the surface on antioxidant activity

2019

Two binucleating hezaaza macrocycles containing a pyridinol spacer have been prepared and characterised. Protonation studies indicate the deprotonation of the phenol group at relatively low pH values with the concomitant occurrence of a keto-enolic equilibrium. These ligands readily form binuclear Cu2+ and Zn2+ complexes as denoted by potentiometric and spectroscopic studies. The binding of the metals yields to the ready deprotonation of the phenol with the stabilisation of the keto form that results in complexes of greater stabilities than the analogous ones containing pyridine as spacer instead of pyridine. Mixed Cu2+–Zn2+-complexes were also detected in aqueous solutions containing equim…

inorganic chemicalsAqueous solutionbiologyChemistryGeneral Chemical EngineeringPotentiometric titrationchemistry.chemical_elementProtonation02 engineering and technologyGeneral Chemistry010402 general chemistry021001 nanoscience & nanotechnology01 natural sciencesMedicinal chemistryCopper0104 chemical sciencesSuperoxide dismutasechemistry.chemical_compoundDeprotonationPyridinebiology.proteinPhenol0210 nano-technologyRSC Advances
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Phosphorylation of the Goodpasture antigen by type A protein kinases.

1995

Collagen IV is the major component of basement membranes. The human alpha 3 chain of collagen IV contains an antigenic domain called the Goodpasture antigen that is the target for the circulating immunopathogenic antibodies present in patients with Goodpasture syndrome. Characteristically, the gene region encoding the Goodpasture antigen generates multiple alternative products that retain the antigen amino-terminal region with a five-residue motif (KRGDS). The serine therein appears to be the major in vitro cAMP-dependent protein kinase phosphorylation site in the isolated antigen and can be phosphorylated in vitro by two protein kinases of approximately 50 and 41 kDa associated with human …

inorganic chemicalsCollagen Type IVAnti-Glomerular Basement Membrane DiseaseMolecular Sequence DataBiochemistryAutoantigensSerineAntigenmedicineSerineGoodpasture syndromeHumansAmino Acid SequencePhosphorylationProtein kinase AMolecular BiologyBasement membranebiologyBase SequenceKinaseCell Biologymedicine.diseaseMolecular biologyCyclic AMP-Dependent Protein Kinasesenzymes and coenzymes (carbohydrates)medicine.anatomical_structureOligodeoxyribonucleotidesbiology.proteinPhosphorylationCollagenAntibodyThe Journal of biological chemistry
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Investigation of Activities for Pt-M Bimetallic Nanoparticles Catalysts on the Oxygen Reduction Reaction

2015

Bi-metallic Pt3Ni/C and Pt3Co/C electrocatalysts were successfully synthesized by a solvent free chemical vapour deposition method with a narrow particle size distribution. The results showed that the electrochemical surface area was increased by adding the additional Ni or Co to a pure Pt catalyst. Pt3Ni/C catalyst exhibited a significant enhancement of oxygen reduction reaction activity. The catalysts were characterized by EDS, XRD, HRTEM and electrochemical activity was determined using cyclic voltammetry.

inorganic chemicalsMaterials scienceChemical engineeringNanoparticleChemical vapor depositionCyclic voltammetryCondensed Matter PhysicsElectrocatalystHigh-resolution transmission electron microscopyElectrochemistryBimetallic stripElectronic Optical and Magnetic MaterialsCatalysisFerroelectrics
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Influence of oxide substrates on monolayer graphene doping process by thermal treatments in oxygen

2019

Abstract The structural and the electronic properties of monolayer graphene made by chemical vapor deposition and transferred on various oxide substrates ( SiO 2 , Al 2 O 3 , and HfO 2 ) are investigated by Raman Spectroscopy and Atomic Force Microscopy in order to highlight the influence of the substrate on the features of p-doping obtained by O 2 thermal treatments. By varing the treatment temperature up to 400 °C, the distribution of the reaction sites of the substrates is evaluated. Their total concentration and the consequent highest doping available is determined and it is shown that this latter is linked to the water affinity of the substrate. Finally, by varing the exposure time to …

inorganic chemicalsMaterials scienceDiffusionOxide02 engineering and technologyChemical vapor depositiondoping010402 general chemistry01 natural sciencesGraphene Thermal doping Substrate effectslaw.inventionsymbols.namesakechemistry.chemical_compoundAdsorptionlawGeneral Materials ScienceGrapheneDopinggraphenetechnology industry and agricultureSubstrate (chemistry)General Chemistry021001 nanoscience & nanotechnology0104 chemical sciencesChemical engineeringchemistrysymbols0210 nano-technologyRaman spectroscopyhigh-k dielectrics
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Comparative study of initial stages of copper immersion deposition on bulk and porous silicon

2013

Initial stages of Cu immersion deposition in the presence of hydrofluoric acid on bulk and porous silicon were studied. Cu was found to deposit both on bulk and porous silicon as a layer of nanoparticles which grew according to the Volmer-Weber mechanism. It was revealed that at the initial stages of immersion deposition, Cu nanoparticles consisted of crystals with a maximum size of 10 nm and inherited the orientation of the original silicon substrate. Deposited Cu nanoparticles were found to be partially oxidized to Cu2O while CuO was not detected for all samples. In contrast to porous silicon, the crystal orientation of the original silicon substrate significantly affected the sizes, dens…

inorganic chemicalsMaterials scienceImmersion depositionSiliconNanochemistryNanoparticlechemistry.chemical_elementNanotechnologyPorous siliconcomplex mixtureschemistry.chemical_compoundHydrofluoric acidMaterials Science(all)Porous siliconnanotechnology nanotechnology and microengineering nanoscale science and technologyGeneral Materials ScienceNano ExpressNanocrystalline silicontechnology industry and agricultureCondensed Matter Physicsequipment and suppliesCopperstomatognathic diseasesElectron backscatter diffractionChemical engineeringchemistrycopper nanoparticles; electron backscatter diffraction; immersion deposition; nanotechnology nanotechnology and microengineering nanoscale science and technology; porous siliconCopper nanoparticlesElectron backscatter diffractionNanoscale Research Letters
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Optimized bath for electroless deposition of palladium on amorphous alumina membranes

2006

A new bath for the electroless deposition of palladium on anodic alumina (AA) membranes is proposed. It was found that the optimal conditions for the uniform deposition of palladium, with minimal damage to the AA membranes, were under conditions of pH 8.4 and plating times shorter than 30 min. The deposited Pd layer was detected by X-ray diffraction (XRD) and energy dispersive X-ray (EDX) analysis. The morphology of the AA membrane before and after plating was examined by scanning electron microscopy (SEM). EDX analysis revealed that palladium was deposited only on the surfaces of the membrane and Sn ions, coming from the sensitizing bath, were incorporated into the palladium layer. EDTA in…

inorganic chemicalsMaterials scienceScanning electron microscopeInorganic chemistrychemistry.chemical_elementSurfaces and InterfacesGeneral ChemistryCondensed Matter PhysicsSurfaces Coatings and FilmsAmorphous solidMembranechemistryAluminiumPlatingMaterials ChemistryFourier transform infrared spectroscopyElectroless deposition Palladium Dehydrogenation Anodic alumina membranesLayer (electronics)PalladiumSurface and Coatings Technology
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Determination of the Boron/Lead Ratio in Ceramic Materials Based on Electrochemical Quartz Crystal Microbalance

2004

A method for quantitatively determining the relationship boron/lead in ceramic materials is presented. It is based on the attachment of microsamples of ceramic frits to an electrochemical quartz crystal microbalance (EQCM). After a reductive deposition step in the � 0.25 to � 0.85 V (vs. AgCl/Ag) potential range, well-defined stripping peaks are recorded in 0.10 M NaCl plus 0.10 M mannitol. The deposition of boron and lead from suspensions of solid materials, and its subsequent oxidative dissolution can be monitorized at the EQCM. The quotient between the maximum mass gain and the corresponding charge passed enables for a direct quantitation of the boron/lead molar ratio in ceramic material…

inorganic chemicalsMaterials scienceStripping (chemistry)chemistry.chemical_elementQuartz crystal microbalanceCeramic materialsElectrochemistryAnalytical Chemistrychemistryvisual_artElectrochemistryvisual_art.visual_art_mediumDeposition (phase transition)CeramicBoronVoltammetryDissolutionElectroanalysis
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Dependence of the emission properties of the germanium lone pair center on Ge doping of silica

2011

We present an experimental investigation regarding the changes induced by the Ge doping level on the emission profile of the germanium lone pair center (GLPC) in Ge doped silica. The investigated samples have been produced by the sol-gel method and by plasma-activated chemical vapor deposition and have doping levels up to 20% by weight. The recorded photoluminescence spectra show that the GLPC emission profile is the same when the Ge content is lower than ∼ 1% by weight, whereas it changes for higher doping levels. We have also performed Raman scattering measurements that show the decrease of the D1 Raman band at 490 cm( - 1) when the Ge content is higher than 1% by weight. The data suggest…

inorganic chemicalsPhotoluminescenceMaterials scienceSettore FIS/01 - Fisica SperimentaleDopingtechnology industry and agricultureAnalytical chemistrychemistry.chemical_elementGermaniumChemical vapor depositionCondensed Matter PhysicsCrystallographic defectSpectral linesymbols.namesakechemistrysymbolsGe-doped silica point defects structural propertiesddc:530General Materials ScienceLone pairRaman scatteringJournal of Physics: Condensed Matter
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A surface EXAFS study of thin nickel deposits on (110) TiO2 surfaces

1997

Abstract The first stages of nickel deposition on a clean (110) TiO 2 surface were studied using surface extended X-ray absorption fine structure (EXAFS). Experiments were performed on two kinds of nickel deposits, one of 0.8 equivalent monolayers and another of 1.6 equivalent monolayers. Depositions were performed on well characterized TiO 2 (110)-p(1 × 1) surfaces. The correlation of Auger experiments with EXAFS results showed that no islands were present on the surface; only two-dimensional growth of nickel was observed. Moreover, it was shown, in the case of the thinner deposit, that a model with nickel atoms forming chains in the channels determined by oxygen atoms on the surface is co…

inorganic chemicalsSurface (mathematics)Extended X-ray absorption fine structureChemistryMetals and AlloysAnalytical chemistryNickel depositionchemistry.chemical_elementSurfaces and InterfacesSurfaces Coatings and FilmsElectronic Optical and Magnetic MaterialsAugerCrystallographyNickelOxygen atomMonolayerMaterials ChemistryAbsorption (chemistry)Thin Solid Films
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