Search results for "Epos"

showing 10 items of 1649 documents

Atomic layer deposition of AlN from AlCl3 using NH3 and Ar/NH3 plasma

2018

The atomic layer deposition (ALD) of AlN from AlCl3 was investigated using a thermal process with NH3 and a plasma-enhanced (PE)ALD process with Ar/NH3 plasma. The growth was limited in the thermal process by the low reactivity of NH3, and impractically long pulses were required to reach saturation. Despite the plasma activation, the growth per cycle in the PEALD process was lower than that in the thermal process (0.4A ° vs 0.7A ° ). However, the plasma process resulted in a lower concentration of impurities in the films compared to the thermal process. Both the thermal and plasma processes yielded crystalline films; however, the degree of crystallinity was higher in the plasma process. The…

optical propertiescrystal structureMaterials scienceSiliconta221Analytical chemistrychemistry.chemical_element02 engineering and technologyoptiset ominaisuudet01 natural sciencespiezoelectric filmsAtomic layer depositionCrystallinityImpurity0103 physical sciencesWaferta216010302 applied physicsta114Plasma activationWide-bandgap semiconductorSurfaces and InterfacesPlasmaatomikerroskasvatus021001 nanoscience & nanotechnologyCondensed Matter PhysicsSurfaces Coatings and Filmsdermatologychemistryatomic layer deposition0210 nano-technologyJournal of Vacuum Science and Technology A
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SU ALCUNE STRATEGIE COMPORTAMENTALI IN EULOFIDI ECTOPARASSITOIDI (HYMENOPTERA, CHALCIDOIDEA).

2000

ovideposizione ovicidio parassitoidi Eulophidae minatrice serpentina agrumi sviluppo preimmaginaleSettore AGR/11 - Entomologia Generale E Applicata
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One-dimensional nanostructures as electrode materials for water electrolysis

2010

palladium alloyPEM electolyzerSettore ING-IND/23 - Chimica Fisica Applicatawater electrolysinanostructured materialtemplate depositionruthenium oxide
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FORMAZIONE DI PATTERN PER IL PROCESSO DELL'ELETTRODEPOSIZIONE IN MODELLI DI TIPO REAZIONE-DIFFUSIONE

2014

pattern formationweakly nonlinear analysisTuring instabilityelectrodepositionSettore MAT/07 - Fisica Matematica
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Semiconductors: Growth and Characterization

2018

Semiconducting materials are widely used in several applications such as photonics, photovoltaics, electronics and thermoelectrics, because of their optical and electro-optical features. The fundamental and technological importance of these materials is due to the unique physical and chemical properties. Over the years, numerous methods have been developed for the synthesis of high efficient semiconductors. Besides, a variety of approach and characterization methods have been used to study the numerous and fascinating properties of the semiconducting materials. This book collects new developments about semiconductors, from the fundamental issues to the synthesis and applications. Special at…

photovoltaicphotonicSettore ING-IND/23 - Chimica Fisica Applicatanano materialtemplate synthesinanowireelectronicelectrodepositionSemiconductorthermoelectric
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CulnSe2/Zn(S,O,OH) junction on Mo foil by electrochemical and chemical route for photovoltaic applications

2014

Electrodeposition is a convenient technique for the development of low cost materials for photovoltaic (PV) device processing. Using a single step electrodeposition route, several groups have fabricated CIS (CuInSe) and CIGS (CuInGaSe) films [1]. One of the most important requirements for successful application of one-step electrodeposition film formation, is the ability to control composition of the deposited films and to develop polycrystalline microstructures with a low surface roughness and high sintered density. In this preliminary work, CIS films were produced by single bath electrodeposition finding the optimal conditions in order to achieve a dense film with high crystallinity and u…

photovoltaicSSettore ING-IND/23 - Chimica Fisica ApplicataElectrodepositionSolar CellSettore ING-INF/02 - Campi ElettromagneticiThin FilmCulnSe2Settore ING-INF/01 - ElettronicaMo foil
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Microscratch testing method for systematic evaluation of the adhesion of atomic layer deposited thin films on silicon

2016

The scratch test method is widely used for adhesion evaluation of thin films and coatings. Usual critical load criteria designed for scratch testing of coatings were not applicable to thin atomic layer deposition (ALD) films on silicon wafers. Thus, the bases for critical load evaluation were established and the critical loads suitable for ALD coating adhesion evaluation on silicon wafers were determined in this paper as LCSi1, LCSi2, LCALD1, and LCALD2, representing the failure points of the silicon substrate and the coating delamination points of the ALD coating. The adhesion performance of the ALD Al2O3, TiO2, TiN, and TaCN+Ru coatings with a thickness range between 20 and 600 nm and dep…

piiMaterials scienceSiliconAnnealing (metallurgy)ta221chemistry.chemical_element02 engineering and technologyengineering.material01 natural sciencesAtomic layer depositionCoatingadheesio0103 physical sciencesWaferThin filmta216computer.programming_language010302 applied physicsta114MetallurgysiliconSurfaces and Interfacesatomikerroskasvatus021001 nanoscience & nanotechnologyCondensed Matter PhysicsSurfaces Coatings and Filmsadhesionthin filmschemistryscratch testScratchatomic layer depositionengineeringohutkalvot0210 nano-technologyTincomputerJournal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
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Varying plant protein sources in the diet of sea bass Dicentrarchus labrax differently affects lipid metabolism and deposition

2010

The liver activity of lipogenic enzymes, the lipid content in various tissues, and plasma lipid levels of major, were measured in sea bass (D. labrax) fed over 96 days either a, fish meal-based control diet or preparations where 70% of fish meal protein was replaced by wheat gluten singly or in combination with pea or soybean meals. Relative to the controls, sea bass fed the wheat gluten-based diet resulted in stimulated lipogenesis in liver and increased lipid deposition in muscle. The opposite occurred when a substantial amount of soybean meal was included in the diet. Mesenteric fat depots were apparently insensitive to major changes in dietary protein source in fish showing similar inta…

plant protein sourcesDicentrarchus labrax; feeding; plant protein sources; adiposity040301 veterinary sciencesSoybean mealSea bassPlant protein sources Adiposity Sea bass.0403 veterinary sciencePlant protein sourceFish mealSettore BIO/10 - BiochimicaDicentrarchus labraxSettore AGR/18 - Nutrizione E Alimentazione AnimaleFood scienceSea basslcsh:SF1-1100Adipositybiology0402 animal and dairy sciencefood and beveragesLipid metabolism04 agricultural and veterinary sciencesbiology.organism_classification040201 dairy & animal scienceBiochemistryPlant proteinLipogenesisAnimal Science and ZoologyDicentrarchussense organslcsh:Animal cultureDeposition (chemistry)feeding
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Aluminum tri-isopropoxide as an alternative precursor for atomic layer deposition of aluminum oxide thin films

2019

Due to the safety challenges associated with the use of trimethylaluminum as a metal precursor for the deposition of alumina, different chemicals have been investigated over the years to replace it. The authors have investigated the use of aluminum tri-isopropoxide (TIPA) as an alternative alkoxide precursor for the safe and cost-effective deposition of alumina. In this work, TIPA is used as a stable Al source for atomic layer deposition (ALD) of Al2O3 when different oxidizing agents including water, oxygen plasma, water plasma, and ozone are employed. The authors have explored the deposition of Al2O3 using TIPA in ALD systems operating in vacuum and atmospheric pressure conditions. For the…

plasma processingMaterials scienceAtmospheric pressurechemistry.chemical_elementSurfaces and InterfacesatomikerroskasvatusplasmafysiikkaCondensed Matter PhysicsSurfaces Coatings and FilmsAtomic layer depositionchemistry.chemical_compoundthin filmsX-ray photoelectron spectroscopychemistryChemical engineeringAluminiumatomic layer depositionOxidizing agentAlkoxideDeposition (phase transition)nanohiukkasetnanoparticlesThin filmJournal of Vacuum Science & Technology A
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Spatial representations of future in Homeric Greek

2015

The aim of this paper is to investigate the space-time mapping of the future in Homeric Greek. It is widely accepted that the spatial adverbs πρόσσω ‘in front’ and ὀπίσσω ‘behind’ in the Homeric poems are used to portray temporal events located in a sequence of aligned entities that follow one after the other on the same path (Dunkel, 1983, p. 66). In such a temporal sequence, or Time-rp model, those adverbs are associated respectively to past and future events in a bipartite spatial representation of time, without involving a deictic ego-experiencer. After analyzing data from the Homeric poems in a cognitive linguistic perspective, it is found that some temporal uses of the preposition πρό…

positional termsTime-RP modelIN FRONT prepositionSpace-time mappingHomeric GreekSettore L-LIN/01 - Glottologia E Linguistica
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