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Vecāku iesaiste jaunu skolēnu/audzēkņu valodas apguvē

2017

Plaša un noderīga vārdu krājuma attīstība veicina gan lasītprasmi, gan palīdz skolēnam veiksmīgi iesaistīties sociālajā dzīvē. Turklāt sabiedrība bieži vien ir pārliecināta, ka pilnīgs un plašs vārdu krājums raksturo izglītotu un intelektuāli attīstītu personu. Noderīga un spēcīgi attīstīta vārdu krājuma izveide ir galvenais faktors valodas apguvei pamatlīmenī. Taču valodu skolotājiem bieži problēmas sagādā vispiemērotākās metodes izvēle, kas palīdzētu apgūt valodu un tās vārdu krājumu. Viena no visefektīvākajām pieejām, kuru var lietot valodas apguvē, ir vecāku iesaiste, tā kā vecāki ir bērnu pirmie tiešie skolotāji un ieņem ļoti nozīmīgu lomu viņu bērnu izglītības pamatu izveidē – jo īpaš…

parental involvementPedagoģijalexiconvocabulary tasksvocabulary acquisitionvocabulary
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Attitudine critica e riconoscenza. Una lettura dell'elenchos in chiave agatologica

2018

pensiero critico riconoscenzaSettore M-FIL/01 - Filosofia Teoretica
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BU 06. Alcuni spazi pubblici del quartiere Borgo ulivia Falsomiele

2012

Il volume raccoglie i risultati della ricerca Nazionale Prin 2007 “ Riqualificazione e aggiornamanto del patrimonio di edilizia pubblica. Linee guida per gli interventi nei quartieri innovativi IACP nell’italia centromeridionale” svolti dall’unità Palermitana (responsabile Andrea Sciascia). L’autrice partecipa alla ricerca MIUR PRIN 2007 elaborando un’ipotesi di progetto per l’area del borgo Ulivia a Palermo. Il progetto, che ha affrontato il tema “BU.06, Pedonalità e Carrabilità. Alcuni spazi pubblici del quartiere Borgo Ulivia – Falsomiele”, elaborato grazie a un gruppo di giovani architetti siciliani, è descritto attraverso gli elaborati pubblicati nella seconda parte del volume.

periferiericonfigrazionespazi pubblicicittàSettore ICAR/14 - Composizione Architettonica E Urbanaprogettoquartieri perifericiprogetto; spazi pubblici; periferie; città;quartieri periferici; riconfigrazione
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Signal to noise ratio measurements of silicon photomultipliers

2014

We report on our signal to noise ratio (SNR) measurements carried out, in the continuous wave regime, on a novel class of silicon photomultipliers (SiPMs) fabricated in planar technology on silicon p-type substrate. SiPMs are large area detectors consisting of a parallel array of Geiger Mode APDs with individual integrated quenching resistors. Each photodiode is an independent photon counting microcell and is connected to a common analog output to produce a summation signal proportional to the number of detected photons [1], [2]. SNR of SiPMs is expressed by the ratio of the SiPM average signal current and the RMS deviation of the overall current (i.e., the overall shot noise current). The …

photomultipliers silicon snr detectorSettore ING-INF/02 - Campi ElettromagneticiSettore ING-INF/01 - Elettronica
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A silicon photomultiplier-based analog front-end for DC component rejection and pulse wave recording in photoplethysmographic applications

2022

The growing attention towards healthcare and the constant technological innovations in the field of semiconductor components have allowed a widespread availability of smaller devices, suitable to be worn and able to continuously acquire physiological signals. Wearable devices are, however, more prone to yield signals corrupted by artifacts caused by movement. This issue is particularly relevant in photoplethysmographic (PPG) applications where also, to exploit the whole dynamic range of the acquisition device, the DC component of the signal should be removed and the AC component amplified. In this context, we have designed and realized an analog front-end (AFE) suitable to be integrated wit…

photoplethysmography (PPG)bio-sensing applicationSettore ING-INF/06 - Bioingegneria Elettronica E InformaticaAnalog front-end (AFE)wearable health devices (WHD)silicon photomultiplier (SiPM)Settore ING-INF/01 - Elettronica2022 IEEE International Symposium on Medical Measurements and Applications (MeMeA)
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Thin Film CIGS Solar Cells, Photovoltaic Modules, and the Problems of Modeling

2013

Starting from the results regarding a nonvacuum technique to fabricate CIGS thin films for solar cells by means of single-step electrodeposition, we focus on the methodological problems of modeling at cell structure and photovoltaic module levels. As a matter of fact, electrodeposition is known as a practical alternative to costly vacuum-based technologies for semiconductor processing in the photovoltaic device sector, but it can lead to quite different structural and electrical properties. For this reason, a greater effort is required to ensure that the perspectives of the electrical engineer and the material scientist are given an opportunity for a closer comparison and a common language.…

photovoltaic moduleArticle SubjectComputer sciencelcsh:TJ807-830CIGS solar celllcsh:Renewable energy sourcessolar energyNanotechnologySettore ING-IND/32 - Convertitori Macchine E Azionamenti ElettriciSettore ING-INF/01 - ElettronicamodellingGeneral Materials ScienceThin filmThin-film solar cellRenewable Energy Sustainability and the Environmentbusiness.industryPhotovoltaic systemSettore ING-INF/02 - Campi ElettromagneticiGeneral ChemistrysimulationEngineering physicsCopper indium gallium selenide solar cellsAtomic and Molecular Physics and OpticsSemiconductorThin-film solar cells; CIGS solar cells; modelling; simulations; photonic structures; photovoltaic modules; solar energyCell structurephotonic structurebusiness
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Semiconductors: Growth and Characterization

2018

Semiconducting materials are widely used in several applications such as photonics, photovoltaics, electronics and thermoelectrics, because of their optical and electro-optical features. The fundamental and technological importance of these materials is due to the unique physical and chemical properties. Over the years, numerous methods have been developed for the synthesis of high efficient semiconductors. Besides, a variety of approach and characterization methods have been used to study the numerous and fascinating properties of the semiconducting materials. This book collects new developments about semiconductors, from the fundamental issues to the synthesis and applications. Special at…

photovoltaicphotonicSettore ING-IND/23 - Chimica Fisica Applicatanano materialtemplate synthesinanowireelectronicelectrodepositionSemiconductorthermoelectric
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Deepening Inside the Pictorial Layers of Etruscan Sarcophagus of Hasti Afunei: An Innovative Micro-Sampling Technique for Raman/SERS Analyses

2019

The Hasti Afunei sarcophagus is a large Etruscan urn, made up of two chalky alabaster monoliths. Dated from the last quarter of the third century BC, it was found in 1826 in the small town of Chiusi (Tuscany- Il Colle place) by a landowner, Pietro Bonci Casuccini, who made it part of his private collection. The noble owner&rsquo

pictorial layerSmall townmedia_common.quotation_subjectPharmaceutical ScienceColor02 engineering and technologyengineering.materialmadder lakeSpectrum Analysis Raman01 natural sciencesArticlesarcophagusSERS analysesAnalytical Chemistrylcsh:QD241-441Egyptian bluechemistry.chemical_compoundImaging Three-Dimensionallcsh:Organic chemistryDrug Discoverymicrosampling techniquepictorial layer; Etruscan; sarcophagus; SERS analyses; Egyptian blue; madder lake; microsampling techniquePhysical and Theoretical ChemistryIconographyColoring Agentsmedia_common010401 analytical chemistryOrganic ChemistrySettore CHIM/06 - Chimica OrganicaArt021001 nanoscience & nanotechnologyArchaeology0104 chemical sciencesCultural heritageAlabasterchemistryArchaeologyItalyChemistry (miscellaneous)Egyptian blueMicro samplingengineeringMolecular MedicineMicrotechnologyPrivate collectionSarcophagus0210 nano-technologyEtruscanSarcophaguMolecules
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Removal of silicon from CFB-derived fly ash leachate in the context of phosphorus recovery

2018

High concentrations of dissolved silica in the acid leachate impose two major challenges on precipitation based recovery of phosphorus (P). Firstly, co-precipitation of colloidal silica in the acidic regimes decreases the purity and value of precipitated P-products. In addition, silica scaling on internal surfaces of equipment is also a problematic issue in industrial operations. Therefore, removal of dissolved silica prior to P-recovery process minimizes the risks of Si-contamination in P-products and Si-scaling. In the present study, silica removal was achieved by accelerated silica polymerization with higher acidity and ionic strength of mineral acid, which also assisted the leaching of …

piiDissolved silicaSiliconColloidal silicachemistry.chemical_element02 engineering and technologyIndustrial and Manufacturing Engineeringphosphorus recyclesilica polymerization020401 chemical engineeringMaterials ChemistrylentotuhkaLeachate0204 chemical engineeringta116ta215fosforichemistry.chemical_classificationChemistryMetals and AlloysMineral acidrespiratory system021001 nanoscience & nanotechnologyfly ash utilizationtalteenottoChemical engineeringIonic strengthFly ashsilica removalLeaching (metallurgy)0210 nano-technologyHydrometallurgy
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Microscratch testing method for systematic evaluation of the adhesion of atomic layer deposited thin films on silicon

2016

The scratch test method is widely used for adhesion evaluation of thin films and coatings. Usual critical load criteria designed for scratch testing of coatings were not applicable to thin atomic layer deposition (ALD) films on silicon wafers. Thus, the bases for critical load evaluation were established and the critical loads suitable for ALD coating adhesion evaluation on silicon wafers were determined in this paper as LCSi1, LCSi2, LCALD1, and LCALD2, representing the failure points of the silicon substrate and the coating delamination points of the ALD coating. The adhesion performance of the ALD Al2O3, TiO2, TiN, and TaCN+Ru coatings with a thickness range between 20 and 600 nm and dep…

piiMaterials scienceSiliconAnnealing (metallurgy)ta221chemistry.chemical_element02 engineering and technologyengineering.material01 natural sciencesAtomic layer depositionCoatingadheesio0103 physical sciencesWaferThin filmta216computer.programming_language010302 applied physicsta114MetallurgysiliconSurfaces and Interfacesatomikerroskasvatus021001 nanoscience & nanotechnologyCondensed Matter PhysicsSurfaces Coatings and Filmsadhesionthin filmschemistryscratch testScratchatomic layer depositionengineeringohutkalvot0210 nano-technologyTincomputerJournal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
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