Search results for "Interfaces."
showing 10 items of 1252 documents
Mechanical and optical properties of as-grown and thermally annealed titanium dioxide from titanium tetrachloride and water by atomic layer deposition
2021
Funding Information: This work was carried out within the MECHALD project funded by Business Finland (Tekes) and is linked to the Finnish Centers of Excellence in Atomic Layer Deposition (ref. 251220) and Nuclear and Accelerator Based Physics (refs. 213503 and 251353) of the Academy of Finland. Funding Information: This work was carried out within the MECHALD project funded by Business Finland (Tekes) and is linked to the Finnish Centers of Excellence in Atomic Layer Deposition (ref. 251220 ) and Nuclear and Accelerator Based Physics (refs. 213503 and 251353 ) of the Academy of Finland. Publisher Copyright: © 2021 The use of thin-films made by atomic layer deposition (ALD) is increasing in …
Atomic layer deposition of AlN from AlCl3 using NH3 and Ar/NH3 plasma
2018
The atomic layer deposition (ALD) of AlN from AlCl3 was investigated using a thermal process with NH3 and a plasma-enhanced (PE)ALD process with Ar/NH3 plasma. The growth was limited in the thermal process by the low reactivity of NH3, and impractically long pulses were required to reach saturation. Despite the plasma activation, the growth per cycle in the PEALD process was lower than that in the thermal process (0.4A ° vs 0.7A ° ). However, the plasma process resulted in a lower concentration of impurities in the films compared to the thermal process. Both the thermal and plasma processes yielded crystalline films; however, the degree of crystallinity was higher in the plasma process. The…
Hexagonal Microparticles from Hierarchical Self-Organization of Chiral Trigonal Pd3L6 Macrotetracycles
2021
Construction of structurally complex architectures using inherently chiral, asymmetric, or multi-heterotopic ligands is a major challenge in metallosupramolecular chemistry. Moreover, the hierarchical self-organization of such complexes is unique. Here, we introduce a water-soluble, facially amphiphilic, amphoteric, chiral, asymmetric, and hetero-tritopic ligand derived from natural bile acid, ursodeoxycholic acid. We show that via the supramolecular transmetalation reaction, using nitrates of Cu(II) or Fe(III), and subsequently Pd(II), a superchiral Pd3L6 complex can be obtained. Even though several possible constitutional isomers of Pd3L6 could be formed, because of the ligand asymmetry a…
Microscratch testing method for systematic evaluation of the adhesion of atomic layer deposited thin films on silicon
2016
The scratch test method is widely used for adhesion evaluation of thin films and coatings. Usual critical load criteria designed for scratch testing of coatings were not applicable to thin atomic layer deposition (ALD) films on silicon wafers. Thus, the bases for critical load evaluation were established and the critical loads suitable for ALD coating adhesion evaluation on silicon wafers were determined in this paper as LCSi1, LCSi2, LCALD1, and LCALD2, representing the failure points of the silicon substrate and the coating delamination points of the ALD coating. The adhesion performance of the ALD Al2O3, TiO2, TiN, and TaCN+Ru coatings with a thickness range between 20 and 600 nm and dep…
Effect of Molybdate on Corrosion Performance of Oxide Coating Produced on 7075 Al Alloy Using PEO
2022
In this research, plasma electrolytic oxidation (PEO) coatings were prepared on 7075 Al alloy in a silicate-based solution with Na2MoO4 additive using a unipolar waveform at constant current density. The coatings displayed micro-pores, micro-cracks, pancake-like and crater-like features, and also solidified molten oxide particles on the surface. The coatings were majorly composed of Al2O3 (γ, δ, and α), SiO2 (amorphous), and MoO3 phases, which confirms the incorporation of molybdenum in the case of additive-containing coatings. Molybdenum species were transported through cracks, channels, and micropores, as the ready access pathways into the coating and partly sealed the c…
Aluminum tri-isopropoxide as an alternative precursor for atomic layer deposition of aluminum oxide thin films
2019
Due to the safety challenges associated with the use of trimethylaluminum as a metal precursor for the deposition of alumina, different chemicals have been investigated over the years to replace it. The authors have investigated the use of aluminum tri-isopropoxide (TIPA) as an alternative alkoxide precursor for the safe and cost-effective deposition of alumina. In this work, TIPA is used as a stable Al source for atomic layer deposition (ALD) of Al2O3 when different oxidizing agents including water, oxygen plasma, water plasma, and ozone are employed. The authors have explored the deposition of Al2O3 using TIPA in ALD systems operating in vacuum and atmospheric pressure conditions. For the…
Fresh-Cut Mangoes: How to Increase Shelf Life by Using Neem Oil Edible Coating
2022
The mango is the most widely cultivated tropical fruit. Fresh-cut mango is very useful, but it is very perishable. The purpose of this study was to highlight the effects of neem oil on fresh-cut mango fruits kept for 9 days at 4 ± 1 °C and 80 ± 5% relative humidity. The neem plant (Azadirachta indica) has numerous antioxidant and antibacterial properties. Despite this, very few studies have been carried out on neem oil added to edible coatings (EC) to retard ripening processes. Two formulations were tested: EC1 (hydroxypropyl methylcellulose + CaCl2) and EC2 (hydroxypropyl methylcellulose + CaCl2 + neem oil), both compared with an untreated sample (control). Physicochemica…
Procedures and protocol for soil biodiversity monitoring : ‘RMQS-Biodiv', a french pilot area experience.
2008
PosterFR2116Poster
The contribution of AI to enhance understanding of Cultural Heritage.
2013
The Artificial Intelligence & Cultural Heritage (AI & CH) working group was born in 1999 with the aim at promoting various scientific activities to increase a more active collaboration between the sectors of cultural assets and artificial intelligence. The many events (workshops and schools) organized over the years have shown the validity of this group for exchanging ideas and gathering researchers and practitioners from different fields. New applications of informatics and artificial intelligence have provided the opportunity to produce innovative tools for documenting, managing and communicating cultural heritage. For this anniversary we intend to show how some of the most important meth…
Review article: recommended reading list of early publications on atomic layer deposition - outcome of the "virtual Project on the History of ALD"
2017
Atomic layer deposition (ALD), a gas-phase thin film deposition technique based on repeated, self-terminating gas-solid reactions, has become the method of choice in semiconductor manufacturing and many other technological areas for depositing thin conformal inorganic material layers for various applications. ALD has been discovered and developed independently, at least twice, under different names: atomic layer epitaxy (ALE) and molecular layering. ALE, dating back to 1974 in Finland, has been commonly known as the origin of ALD, while work done since the 1960s in the Soviet Union under the name "molecular layering" (and sometimes other names) has remained much less known. The virtual proj…