Search results for "Photomask"
showing 6 items of 6 documents
Patterned wafer segmentation
2003
This paper is an extension of our previous work on the image segmentation of electronic structures on patterned wafers to improve the defect detection process on optical inspection tools. Die-to-die wafer inspection is based upon the comparison of the same area on two neighborhood dies. The dissimilarities between the images are a result of defects in this area of one of the die. The noise level can vary from one structure to the other, within the same image. Therefore, segmentation is needed to create a mask and apply an optimal threshold in each region. Contrast variation on the texture can affect the response of the parameters used for the segmentation. This paper shows a method to antic…
Actinic inspection of sub-50 nm EUV mask blank defects
2007
A new actinic mask inspection technology to probe nano-scaled defects buried underneath a Mo/Si multilayer reflection coating of an Extreme Ultraviolet Lithography mask blank has been implemented using EUV Photoemission Electron Microscopy (EUV-PEEM). EUV PEEM images of programmed defect structures of various lateral and vertical sizes recorded at around 13 nm wavelength show that 35 nm wide and 4 nm high buried line defects are clearly detectable. The imaging technique proves to be sensitive to small phase jumps enhancing the visibility of the edges of the phase defects which is explained in terms of a standing wave enhanced image contrast at resonant EUV illumination.
Recess photomask contact lithography and the fabrication of coupled silicon photonic and plasmonic waveguide switches
2015
Display Omitted A lithography technique capable of printing submicron-sized features inside deep cavities is presented.A so-called recess photomask adapted to the wafer's topography is employed.Based on a standard mask aligner, Recess Photomask Contact Lithography has moderate cost.Its efficiency for a photonic/plasmonic switch application was demonstrated experimentally.The technique is extensible to any design and to wafers with multiple level recesses. A novel lithographic method is presented, based on the use of a mask aligner in the contact mode with a modified photomask, the so-called recess photomask; its goal is the printing of submicron-sized patterns into deep cavities of a chip, …
Applicability of a binary amplitude mask for creating correctors of higher-order ocular aberrations in a photoresistive layer
2012
Ocular aberrations can be corrected with wavefront correctors created in a photoresist layer. The simplest type of the mask used in optical lithography is a binary amplitude mask. It is known that such a mask has a periodic hole pattern. The purpose of this research was to assess applicability of a binary amplitude mask for creating ocular wavefront correctors. The photoresist was applied to the substrate by using the dip-coating method. The photoresist layer was illuminated through a mask printed on a transparent film by using a laser printer. The surface of the wavefront correctors was evaluated by aberrometry, scanning electron microscopy and profilometry method. The dip-coating method c…
Content based segmentation of patterned wafers
2004
We extend our previous work on the image segmentation of electronic structures on patterned wafers to improve the defect detection process on optical inspection tools. Die-to-die wafer in- spection is based on the comparison of the same area on two neigh- boring dies. The dissimilarities between the images are a result of defects in this area of one of the dies. The noise level can vary from one structure to the other, within the same image. Therefore, seg- mentation is required to create a mask and apply an optimal thresh- old in each region. Contrast variation on the texture can affect the response of the parameters used for the segmentation. We show a method to anticipate these variation…
High speed microfluidic prototyping by programmable proximity aperture MeV ion beam lithography
2013
Abstract Microfluidics refers to the science and technology for controlling and manipulating fluids that flow along microchannels. For the development of complex prototypes, many microfluidic test structures are required first. Normally, these devices are fabricated via photolithography. This technique requires a photomask for transferring a pattern to photoresists by exposing with UV light. However, this method can be slow when a new structure is required to change. This is because a series of photomasks are needed, which is time consuming and costly. Here, we present a programmable proximity aperture lithography (PPAL) technique for the development of microfluidic prototype in poly(methyl…