Search results for "Sputtering"
showing 10 items of 136 documents
Room-Temperature Micropillar Growth of Lithium-Titanate-Carbon Composite Structures by Self-Biased Direct Current Magnetron Sputtering for Lithium Io…
2019
Here, an unidentified type of micropillar growth is described at room temperature during conventional direct-current magnetron sputtering (DC-MS) deposition from a Li4Ti5O12+graphite sputter target under negative substrate bias and high operating pressure. These fabricated carbon-Li2O-TiO2 microstructures consisting of various Li4Ti5O12/Li2TiO3/LixTiO2 crystalline phases are demonstrated as an anode material in Li-ion microbatteries. The described micropillar fabrication method is a low-cost, substrate independent, single-step, room-temperature vacuum process utilizing a mature industrial complementary metal-oxide-semiconductor (CMOS)-compatible technology. Furthermore, tentative considerat…
Formation of anodic films on sputtering-deposited Al–Hf alloys
2009
Abstract The growth of barrier-type anodic films at high efficiency on a range of sputtering-deposited Al–Hf alloys, containing from 1 to 95 at.% Hf, has been investigated in ammonium pentaborate electrolyte. The alloys encompassed nanocrystalline and amorphous structures, the latter being produced for alloys containing from 26 to 61 at.% Hf. Except at the highest hafnium content, the films were amorphous and contained units of HfO 2 and Al 2 O 3 distributed relatively uniformly through the film thickness. Boron species were confined to outer regions of the films. The boron distributions suggest that the cation transport number decreases progressively with increasing hafnium concentration i…
Sputtered transparent electrodes for optoelectronic devices
2021
Summary Transparent electrodes and metal contacts deposited by magnetron sputtering find applications in numerous state-of-the-art optoelectronic devices, such as solar cells and light-emitting diodes. However, the deposition of such thin films may damage underlying sensitive device layers due to plasma emission and particle impact. Inserting a buffer layer to shield against such damage is a common mitigation approach. We start this review by describing how sputtered transparent top electrodes have become archetypal for a broad range of optoelectronic devices and then discuss the possible detrimental consequences of sputter damage on device performance. Next, we review common buffer-layer m…
A pulsed laser technique for an evaluation of the spall resistance of sputtered oxide films: diagnostic by interferometric probing
1998
Abstract A pulsed laser technique, based on conventional laser acoustics testing, has been developed to define the spall resistance of sputtered oxide films on a metallic target. Direct irradiation of the coated side of the sample generates an acoustic source at the inner film–metal interface. A model of the laser-induced epicentral displacements at the opposite side that takes into account the confining effect of the coating has been proposed to evaluate the critical laser irradiance corresponding to progressive damages at the inner film–metal interface, i.e. interface delamination, film spallation and film expulsion, respectively. The behavior of Al 2 O 3 and ZrO 2 films deposited by PVD …
Schottky barrier height tuning by Hybrid organic-inorganic multilayers
2014
ABSTRACTSemiconducting and insulating polymers and copolymers/Au nanograins based hybrid multilayers (HyMLs) were fabricated on p-Si single-crystal substrate by an iterative method that involves, respectively, Langmuir-Blodgett and spin-coating techniques (for the deposition of organic film) and sputtering technique (for the deposition of metal nanograins) to prepare Au/HyMLs/p-Si Schottky device. The electrical properties of the Au/HyMLs/p-Si Schottky device were investigated by current-voltage (I–V) measurements in the thickness range of 1-5 bilayers (BL).At different number of layers, current-voltage (I–V) measurements were performed. Results showed a rectifying behavior. Junction parame…
Single-Crystal vs Polycrystalline Gold: A Non-linear-Optics Analysis
2017
Standard gold in the field of plasmonics is obtained by evaporation or sputtering and therefore is polycrystalline. Yet, this gold presents numbers of drawbacks such as roughness, grains and ill-defined electronic band diagrams in addition to the lack of reproducibility from one instrument to another. It is, thus, beneficial to turn to a metal production that can enable well-defined and controlled gold parameters. To that end, we have explored the wet synthesis of gold nanoplates which represents a simple and robust means of obtaining single-crystal gold (Guo Z, Zhang Y, DuanMu Y, Xu L, Xie S, Gu N, Colloids Surf A 278:33–38, 2006). The synthesized nanoplates are from 50 to less than 100 nm…
Selective growth and optical properties of sputtered BaTiO3films
2000
we report the growth of BaTiO 3 thin films by standard Radio Frequency sputtering. Without any in situ or post annealing, these polycristalline films are oriented relative to the substrate even when it is amorphous. We show that this preferential orientation may be monitored using a DC Bias during the film growth. At room temperature, cubic films of (100) and (110) orientations have been achieved, on fused silica substrate. Some optical waveguiding properties of these films have been studied. The resulting film index is 2.26 and the optical step index at the substrate interface is sharp. This allows the use of standard RF sputtering techniques to monitor oriented BaTiO 3 films for linear op…
Characterization of thin superconducting YBaCuO-films by Raman-spectroscopy
1988
We have investigated thin sputtered films of the high Tc material YBa2Cu3O7 by means of Raman spectroscopy at different stages of the preparation process. We find that the films are amorphous after sputtering. The Raman spectra indicate that random polycrystalline layers, as well as crystalline layers with preferred orientation, are obtained by an additional thermal treatment.
Characterization of LiFePO4/C Composite Thin Films Using Electrochemical Impedance Spectroscopy
2012
The composite LiFePO4/C thin films were prepared on steel substrate by radio frequency (RF) magnetron sputtering. Electrochemical properties of the obtained thin films were investigated by cyclic voltammetry charge-discharge measurements and electrochemical impedance spectroscopy (EIS). The films annealed at 550 °C exhibited a couple of redox peaks at 3.45 V vs. Li/Li + characteristic for the electrochemical lithium insertion/extraction in LiFePO4. At low current rate such composite thin film showed a discharge capacity of over 110 mAh g -1 . The dependence of charge transfer resistance, double layer capacitance and lithium diffusion coefficients on applied electrode potential were calculat…
Influence of the composition of titanium oxynitride layers on the fretting behavior of functionalized titanium substrates: PVD films versus surface l…
2014
International audience; Abstract In this work we compared the fretting behavior of pure titanium plates functionalized with titanium oxynitride surface layers, obtained by two methods: a Physical Vapor Deposition (PVD) method, reactive magnetron sputtering, and Surface Laser Treatments (SLT), under different mixtures of oxygen and nitrogen. The composition of the layers was determined by nuclear reaction analysis (NRA) and their structure was analyzed by Raman spectroscopy. PVD layers were TiN-like fcc layers, with an oxygen concentration going from 36 to 50 at.%. Three SLT layers were studied. The first one was a TiN-like layer containing ~28 at.% of oxygen. The second one was formed of di…