Search results for "aperture"
showing 10 items of 182 documents
Aperture edge scattering in focused MeV ion beam lithography and nuclear microscopy: An application for the GEANT4 toolkit
2009
Collimators are widely used to define MeV ion beams. Recent studies have shown the capability of combinations of collimators and lenses to define beams of MeV ions with sub-100 nanometre dimensions. Such nanometre beams have potential applications in MeV ion beam lithography, which is the only maskless technique capable of producing extremely high aspect ratio micro- and nano-structrures, as well as in high resolution MeV ion beam based imaging. The ion scattering from the collimator-edges can be a resolution restricting factor in these applications. Scattering processes at edges are difficult to study using conventional simulation codes because of the complicated geometry. In this work we …
Development of micro-contact printing of osteosarcoma cells using MeV ion beam lithography
2009
Abstract For investigation of spatial effects in signalling between cells and also signal substances that trigger cell proliferation and behaviour we are developing a micro Contact Printing process ( μ CP ) . In order to allow printing of cells stamps with high aspect ratio are required and these have been fabricated using Programmed Proximity Aperture Lithography (PPAL) with 3 MeV 4 He 2 + ions to produce PMMA masters for casting the stamps in PDMS. A simple printing device was developed and the first results using this to print human osteosarcoma cells is demonstrated.
A Model to Characterize the D-T Layer of ICF Targets by Backlit Optical Shadowgraphy
2005
A numerical model is presented in order to modelize the bright ring that appears in backlit optical shadowgraphy on a transparent hollow sphere with a solid deuterium-tritium layer inside. This novel model is based on computational calculations applied to the problem of the targets used in inertial confinement fusion. The model takes into account the influences of the optical imaging system (numerical aperture, source divergence, camera resolution, etc.) and the effect of the capsule itself, diameter, thickness, and refractive index, and allows one to analyze the inner surface of a capsule in terms of thickness and roughness.
Fabrication of microfluidic devices using MeV ion beam Programmable Proximity Aperture Lithography (PPAL)
2008
Abstract MeV ion beam lithography is a direct writing technique capable of producing microfluidic patterns and lab-on-chip devices with straight walls in thick resist films. In this technique a small beam spot of MeV ions is scanned over the resist surface to generate a latent image of the pattern. The microstructures in resist polymer can be then revealed using a chemical developer that removes exposed resist, while leaving unexposed resist unaffected. In our system the size of the rectangular beam spot is programmably defined by two L-shaped tantalum blades with well-polished edges. This allows rapid exposure of entire rectangular pattern elements up to 500 × 500 μm in one step. By combin…
Development of economic MeV-ion microbeam technology at Chiang Mai University
2017
Abstract Developing high technologies but in economic manners is necessary and also feasible for developing countries. At Chiang Mai University, Thailand, we have developed MeV-ion microbeam technology based on a 1.7-MV Tandetron tandem accelerator with our limited resources in a cost-effective manner. Instead of using expensive and technically complex electrostatic or magnetic quadrupole focusing lens systems, we have developed cheap MeV-ion microbeams using programmed L-shaped blade aperture and capillary techniques for MeV ion beam lithography or writing and mapping. The programmed L-shaped blade micro-aperture system consists of a pair of L-shaped movable aperture pieces which are contr…
A short-orbit spectrometer for low-energy pion detection in electroproduction experiments at MAMI
2017
A new Short-Orbit Spectrometer (SOS) has been constructed and installed within the experimental facility of the A1 collaboration at Mainz Microtron (MAMI), with the goal to detect low-energy pions. It is equipped with a Browne-Buechner magnet and a detector system consisting of two helium-ethane based drift chambers and a scintillator telescope made of five layers. The detector system allows detection of pions in the momentum range of 50 - 147 MeV/c, which corresponds to 8.7 - 63 MeV kinetic energy. The spectrometer can be placed at a distance range of 54 - 66 cm from the target center. Two collimators are available for the measurements, one having 1.8 msr aperture and the other having 7 ms…
Development of procedures for programmable proximity aperture lithography
2013
Abstract Programmable proximity aperture lithography (PPAL) with MeV ions has been used in Jyvaskyla and Chiang Mai universities for a number of years. Here we describe a number of innovations and procedures that have been incorporated into the LabView-based software. The basic operation involves the coordination of the beam blanker and five motor-actuated translators with high accuracy, close to the minimum step size with proper anti-collision algorithms. By using special approaches, such writing calibration patterns, linearisation of position and careful backlash correction the absolute accuracy of the aperture size and position, can be improved beyond the standard afforded by the repeata…
CERN’s Linac4 cesiated surface H− source
2017
Linac4 cesiated surface H− sources are routinely operated for the commissioning of the CERN’s Linac4 and on an ion source test stand. Stable current of 40-50 mA are achieved but the transmission through the LEBT of 80% was below expectations and triggered additional beam simulation and characterization. The H− beam profile is not Gaussian and emittance measurements are larger than simulation. The status of ongoing development work is described; 36 mA H− and 20 mA D− beams were produced with a 5.5 mm aperture cesiated surface ion source. The emittances measured at the test stand are presented. During a preliminary test, the Linac4 proton source delivered a total beam intensity of 70 mA (p, H…
Emittance Growth by Synchrotron Radiation in a Double-Sided Microtron
1999
Here we present results of calculations of emittance growth caused by quantum fluctuations of synchrotron radiation (QFSR) for a 1.5 GeV double-sided microtron (DSM). We did both semi-analytical estimations, employing known Twiss parameters for the DSM orbits, and a computer simulation of these stochastic effects using the program SYTRACE. This showed that the normalized emittance growth was within reasonable limits, by a factor of about 1.5, thus permitting e.g. the installation of small aperture linacs on the DSM axes.
Power profiles in multifocal contact lenses with variable multifocal zone
2016
BACKGROUND The power profile of multifocal contact lenses has been demonstrated to report important information that could be used during the fitting process. The aim of this work is to describe the power profile of a recent set of gas permeable multifocal contact lenses as a function of the pupil radius. METHODS The measured multifocal contact lenses have a centre-distance design, and are available with five distance-vision diameters (XS, S, M, L and XL) and two different additions: Type A (up to +2.00 D) and Type B (up to +2.50 D). The optical device NIMO TR1504 (Lambda-X, Nivelles, Belgium) was used to obtain the power profile measurements. The optical lens power distribution as a functi…