Search results for "doping"

showing 10 items of 801 documents

DESIGN, SYNTHESIS AND ATOMIC/ELECTRONIC STRUCTURAL ANALYSIS OF HYBRID HALIDE PSEUDO-PEROVSKITES: PERSPECTIVES AND OPEN ISSUES FOR NOVEL THERMOELECTRI…

2022

Settore CHIM/03 - Chimica Generale E Inorganicaperovskites thin films heterovalent doping
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Thermally induced doping in controlled atmosphere on Graphene

2017

Since its experimental breakthrough discovery in 2004, Graphene (Gr) paved the way for the study of the "flatland" of two dimensional (2D) materials. These systems are an emerging topic of interest in solid state physics and amterial sciences, but nont only, and today count a family of monoatomic layer of C atoms in hexgonal honey comb crystalline structure.

Settore FIS/01 - Fisica SperimentaleGraphene thermal treatments doping raman spectroscopy
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Anodic TiO2 in ReRAM: Influence of Si-doping on the Resistive Switching Properties of Titanium Oxide

2016

TiO2 has attracted much attention due to its potential widespread applications, including capacitors, photocatalysis, solar energy conversion and, more recently, redox-based random access memories (ReRAM). For micro and nano-electronics applications, TiO2 is usually grown through Chemical and Physical Vapour Deposition techniques, such as Atomic Layer Deposition (ALD), Pulsed Laser Deposition (PLD), Sputtering and so on. In ReRAM field, the control of oxide structure (crystallinity, defects concentration etc.) and the choice of electrodes are crucial to have resistive switching phenomena inside the oxide. Thus, anodizing can be proposed as a simple and low cost way to grow TiO2 and to tune …

Settore ING-IND/23 - Chimica Fisica ApplicataAnodizing TiO2 ReRAM Si-doping Resistive Switching ReRAMSettore ING-INF/01 - Elettronica
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N-Doped Anatase/Rutile Photocatalysts for the Synthesis of Aromatic Aldehydes Under Ultraviolet and Solar Irradiation

2015

N-doped anatase/rutile photocatalysts were prepared by a sol-gel method, using TiCl4 as TiO2 precursor and urea as N-dopant source. The catalysts required a thermal treatment at temperature higher than 300 degrees C to achieve actual nitrogen doping; this treatment also allowed obtaining crystalline and hydrophobic samples. Moreover, nitrogen doping modified the surface of samples by increasing the anatase to rutile phase ratio and hydrophilicity. The catalysts were characterized by BET specific surface area, XRD, ESEM, TGA, FT-IR, DRS and XPS measurements, with particular attention to the assessment of the N-doping effect. It was found that XPS analysis should be used together with DRS and…

Settore ING-IND/24 - Principi Di Ingegneria ChimicaAnataseMaterials scienceN-Doped TiO2 Photocatalysis Solar Irradiation Green Synthesis p-Anisaldehyde X-ray Photoelectron SpectroscopyInorganic chemistryDopingPhotochemistrymedicine.disease_causeSettore CHIM/03 - Chimica Generale E InorganicaRutilemedicineGeneral Materials ScienceIrradiationUltravioletScience of Advanced Materials
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Fighting doping: sports and criminal law regulatory systems compared

2015

Settore IUS/02 - Diritto Privato Comparatocriminal law sports law doping comparative lawSettore IUS/17 - Diritto Penale
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L’OPERATIVITÀ DEL VINCOLO DI GIUSTIZIA NEL REATO DI DOPING

2014

Settore IUS/16 - Diritto Processuale PenaleSettore IUS/17 - Diritto Penalevincolo di giustizia reato di doping costituzione di parte civile
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Fattori di rischio per doping in popolazione giovanile.

2012

Settore MED/38 - Pediatria Generale E Specialisticadoping alimentazione attività fisica
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L’epoca della dipendenza… sportiva

2014

Settore SPS/07 - Sociologia GeneraleSport doping prestazione spettacolo
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Boron doping of silicon rich carbides: Electrical properties

2013

Boron doped multilayers based on silicon carbide/silicon rich carbide, aimed at the formation of silicon nanodots for photovoltaic applications, are studied. X-ray diffraction confirms the formation of crystallized Si and 3C-SiC nanodomains. Fourier Transform Infrared spectroscopy indicates the occurrence of remarkable interdiffusion between adjacent layers. However, the investigated material retains memory of the initial dopant distribution. Electrical measurements suggest the presence of an unintentional dopant impurity in the intrinsic SiC matrix. The overall volume concentration of nanodots is determined by optical simulation and is shown not to contribute to lateral conduction. Remarka…

Silicon nanodotMaterials scienceSiliconSilicon dioxideBoron dopingInorganic chemistrychemistry.chemical_elementSilicon carbide02 engineering and technologySettore ING-INF/01 - Elettronica7. Clean energy01 natural sciencesSettore FIS/03 - Fisica Della MateriaCarbidechemistry.chemical_compoundUV-vis reflection and transmittanceMultilayer0103 physical sciencesSilicon carbideGeneral Materials ScienceElectrical measurementsSilicon rich carbide010302 applied physicsDopantbusiness.industryMechanical EngineeringDopingFourier transform infrared spectroscopySilica021001 nanoscience & nanotechnologyCondensed Matter PhysicsSilicon richOptical propertieElectrical transportchemistryMechanics of MaterialsUV-vis reflection and transmittance Doping (additives)Boron-dopingOptoelectronicsElectric propertieNanodot0210 nano-technologybusinessX ray diffraction Boron carbideMaterials Science and Engineering: B
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Role of the strain in the epitaxial regrowth rate of heavily doped amorphous Si films

2008

Solid phase epitaxial regrowth (SPER) of p -doped preamorphized Si was studied by time resolved reflectivity. Strain and dopant concentration were opportunely varied by implanting neutral (Ge) and isovalent (B, Ga) impurities in order to disentangle the two different effects on SPER. Larger SPER rate variations occurred in strained doped Si with respect to undoped samples. The generalized Fermi level shifting model was implemented to include the role of the strain and to fit the experimental data over a large range of temperature for p - and n -type doping. We introduced a charged defect, whose energy level is independent of the dopant species. © 2008 American Institute of Physics.

SiliconMaterials scienceSTRESSPhysics and Astronomy (miscellaneous)SiliconAnalytical chemistrychemistry.chemical_elementGalliumEpitaxySettore FIS/03 - Fisica Della MateriaLAYERSsymbols.namesakeImpurityDOPANTPhase (matter)Semiconductor dopingKINETICSSemiconducting silicon compoundDopantAmorphous filmGermaniumSettore ING-INF/03 - TelecomunicazioniFermi levelDopingAmorphous siliconPhosphoruEpitaxial filmAmorphous solidchemistrysymbolsSOLID-PHASE EPITAXY
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