Search results for "erros"
showing 10 items of 88 documents
Mechanical and optical properties of as-grown and thermally annealed titanium dioxide from titanium tetrachloride and water by atomic layer deposition
2021
Funding Information: This work was carried out within the MECHALD project funded by Business Finland (Tekes) and is linked to the Finnish Centers of Excellence in Atomic Layer Deposition (ref. 251220) and Nuclear and Accelerator Based Physics (refs. 213503 and 251353) of the Academy of Finland. Funding Information: This work was carried out within the MECHALD project funded by Business Finland (Tekes) and is linked to the Finnish Centers of Excellence in Atomic Layer Deposition (ref. 251220 ) and Nuclear and Accelerator Based Physics (refs. 213503 and 251353 ) of the Academy of Finland. Publisher Copyright: © 2021 The use of thin-films made by atomic layer deposition (ALD) is increasing in …
Atomic layer deposition of AlN from AlCl3 using NH3 and Ar/NH3 plasma
2018
The atomic layer deposition (ALD) of AlN from AlCl3 was investigated using a thermal process with NH3 and a plasma-enhanced (PE)ALD process with Ar/NH3 plasma. The growth was limited in the thermal process by the low reactivity of NH3, and impractically long pulses were required to reach saturation. Despite the plasma activation, the growth per cycle in the PEALD process was lower than that in the thermal process (0.4A ° vs 0.7A ° ). However, the plasma process resulted in a lower concentration of impurities in the films compared to the thermal process. Both the thermal and plasma processes yielded crystalline films; however, the degree of crystallinity was higher in the plasma process. The…
A stable isotope study of the hydrological and carbon cycle in meromictic lake, Lovojärvi
2012
Lake Lovojärvi, at its deepest point of 17.5 m, is permanently stratified forming two water layers. The mixolimnion (the upper layer, from 0 to 10 m depth) is affected by seasonal changes while the monimolimnion (bottom layer, from 10 to 17.5 m depth) does not mix and is not affected by seasonal changes. As a result, the lake stores large quantities of dissolved inorganic carbon and methane. I used a multiple stable isotope approach to gain insight into the carbon cycle and water balance of Lovojärvi. The δ18O and δ2H profiles reveal that at the 7 m depth in the mixolimnion, there is a sub-surface stream whose isotopic characteristics are similar to surface streams from a nearby mire, sugge…
El perro en el Mediterráneo. Análisis de Oriente y Occidente entre los siglos VI-III a.C.
2023
Desde la domesticación del perro, este nos ha acompañado a lo largo de la vida en múltiples cometidos como los más básicos y fundamentales: la caza, la protección y a partir del Neolítico el pastoreo. Aunque su origen fuera salvaje, acabó formando parte de la vida humana, vinculándose profundamente a las personas, llegando a ser una pieza fundamental en el engranaje no solo de las familias, sino de las sociedades en general. Además del valor que suponía este animal por el desempeño de diversas labores, una particularidad que también nos encontramos en su historia es su sacrificio. Estos se solían realizar debido a una serie de cuestiones, como en momentos de crisis, para paliar las hambruna…
Microscratch testing method for systematic evaluation of the adhesion of atomic layer deposited thin films on silicon
2016
The scratch test method is widely used for adhesion evaluation of thin films and coatings. Usual critical load criteria designed for scratch testing of coatings were not applicable to thin atomic layer deposition (ALD) films on silicon wafers. Thus, the bases for critical load evaluation were established and the critical loads suitable for ALD coating adhesion evaluation on silicon wafers were determined in this paper as LCSi1, LCSi2, LCALD1, and LCALD2, representing the failure points of the silicon substrate and the coating delamination points of the ALD coating. The adhesion performance of the ALD Al2O3, TiO2, TiN, and TaCN+Ru coatings with a thickness range between 20 and 600 nm and dep…
Aluminum tri-isopropoxide as an alternative precursor for atomic layer deposition of aluminum oxide thin films
2019
Due to the safety challenges associated with the use of trimethylaluminum as a metal precursor for the deposition of alumina, different chemicals have been investigated over the years to replace it. The authors have investigated the use of aluminum tri-isopropoxide (TIPA) as an alternative alkoxide precursor for the safe and cost-effective deposition of alumina. In this work, TIPA is used as a stable Al source for atomic layer deposition (ALD) of Al2O3 when different oxidizing agents including water, oxygen plasma, water plasma, and ozone are employed. The authors have explored the deposition of Al2O3 using TIPA in ALD systems operating in vacuum and atmospheric pressure conditions. For the…
Sovelluskerroksella tapahtuvat DDoS-hyökkäykset
2016
Tutkielmassa esitellään sovelluskerroksella tapahtuvia hajautettuja palvelunestohyökkäyksiä eli DDoS-hyökkäyksiä, niiden havaitsemista ja niiltä suojautumista. Lisäksi perehdytään yksityiskohtaisemmin salatuissa yhteyksissä tapahtuvaan hyökkäysten havaitsemiseen. Tarkoituksena on tarjota kattava tietopaketti sovelluskerroksesta ja sen taustana olevista protokollista, palvelunestohyökkäyksistä, DDoS-hyökkäysten havaitsemiseen liittyvästä viimeaikaisesta tutkimuksesta sekä hyökkäyksiltä suojautumisesta. Käytännönosiona simuloidaan erilaisia hitaita hyökkäyksiä (SlowLoris, RUDY, SlowRead), RangeAttack-hyökkäys, porttiskannauksia sekä laskennallinen SSL-hyökkäys salatuissa yhteyksissä ja yritet…
Mitä lieneekin aarteita Suomessa.. : lasten seikkailukierrokset ja elämykselliset opastukset draamallisena kulttuuri-ilmiönä
2001
Review article: recommended reading list of early publications on atomic layer deposition - outcome of the "virtual Project on the History of ALD"
2017
Atomic layer deposition (ALD), a gas-phase thin film deposition technique based on repeated, self-terminating gas-solid reactions, has become the method of choice in semiconductor manufacturing and many other technological areas for depositing thin conformal inorganic material layers for various applications. ALD has been discovered and developed independently, at least twice, under different names: atomic layer epitaxy (ALE) and molecular layering. ALE, dating back to 1974 in Finland, has been commonly known as the origin of ALD, while work done since the 1960s in the Soviet Union under the name "molecular layering" (and sometimes other names) has remained much less known. The virtual proj…
Low-temperature thermal and plasma-enhanced atomic layer deposition of metal oxide thin films
2017
Atomic layer deposition (ALD) is a method for thin film fabrication with atomic level precision. This thesis focuses on low-temperature thermal and plasma- enhanced ALD and presents results on thin film growth by these techniques with examples of common ALD materials: Al2O3, ZnO and TiO2. As an example of limitations of the thermal ALD the nucleation and growth of Al2O3 and ZnO films on different grades of poly(methyl methacrylate) (PMMA) are presented, showing that the initiation of the growth is strongly dependent on both the deposited material and the substrate. A potential application of the ALD ZnO films in polymer surface functionalization is demonstrated by changing in the surface wettab…