Search results for "multilayer"

showing 10 items of 141 documents

Current-Induced Skyrmion Generation through Morphological Thermal Transitions in Chiral Ferromagnetic Heterostructures.

2018

© 2018 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim Magnetic skyrmions promise breakthroughs in future memory and computing devices due to their inherent stability and small size. Their creation and current driven motion have been recently observed at room temperature, but the key mechanisms of their formation are not yet well-understood. Here it is shown that in heavy metal/ferromagnet heterostructures, pulsed currents can drive morphological transitions between labyrinth-like, stripe-like, and skyrmionic states. Using high-resolution X-ray microscopy, the spin texture evolution with temperature and magnetic field is imaged and it is demonstrated that with transient Joule heating, topologica…

Materials scienceMagnetic domainskyrmionsmultilayersperpendicular magnetic anisotropyDzyaloshinkii-Moriya interaction02 engineering and technologymagnetic domains01 natural sciencesEngineering0103 physical sciencesddc:530General Materials ScienceNanoscience & Nanotechnology010306 general physicsSpin-½Magnetization dynamicsCondensed matter physicsTexture (cosmology)Mechanical EngineeringSkyrmion021001 nanoscience & nanotechnologyCondensed Matter::Mesoscopic Systems and Quantum Hall EffectMagnetic fieldFerromagnetismMechanics of MaterialsPhysical SciencesChemical Sciences0210 nano-technologyJoule heating
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Size-filtering effects by stacking InAs/InP (001) self-assembled quantum wires into multilayers

2002

Multilayer structure containing vertically stacked InAs/InP self-assembled quantum wires have been successfully grown by molecular-beam epitaxy. The influence of the InP spacer layer thickness on the structural and optical properties of the wire superlattice has been studied by means of transmission electron microscopy and photoluminescence. The coherent propagation of the strain field in the sample with a 5-nm-thick spacer determines by a size filtering effect a good homogeneity and uniformity of the wire stacks, and hence a good optical quality. The exciton recombination dynamics in the wire superlattice cannot be related to thermal escape of carriers out to the barriers, as occurs in sin…

Materials sciencePhotoluminescenceCondensed matter physicsSuperlatticeExcitonQuantum wiresStackingPhysics::OpticsEpitaxyCondensed Matter::Mesoscopic Systems and Quantum Hall EffectCondensed Matter::Materials ScienceMolecular-beam epitaxyTransmission electron microscopyMultilayer structureHomogeneity (physics)ExcitonPhotoluminescenceMolecular beam epitaxy
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Influence of ZnO/graphene nanolaminate periodicity on their structural and mechanical properties

2018

International audience; Structural, electronic and mechanical properties of ZnO/Graphene (ZnO/G) nanolaminates fabricated by low temperature atomic layer deposition (ALD) and chemical vapor deposition (CVD) were investigated. We performed scanning and transmission electron microscopy (SEM/TEM), X-ray diffraction (XRD), electron energy loss spectroscopy (EELS), Raman spectroscopy, X-Ray photoelectron spectroscopy (XPS) and nanoindentation to characterize the ZnO/G nanolaminates. The main structural and mechanical parameters of ZnO/G nanolaminates were calculated. The obtained results were analyzed and interpreted taking into account mechanical interaction and charge effects occurring at the …

Materials sciencePolymers and Plastics02 engineering and technologyChemical vapor deposition010402 general chemistry01 natural scienceslaw.inventionAtomic layer depositionsymbols.namesakeX-ray photoelectron spectroscopylawXPSNanointendationMaterials ChemistryChemical vapor deposition[CHIM]Chemical SciencesComposite materialNanolaminateGrapheneAtomic layer depositionMechanical EngineeringElectron energy loss spectroscopyMetals and AlloysNanoindentation021001 nanoscience & nanotechnology0104 chemical sciencesMultilayersMechanics of MaterialsTransmission electron microscopyZnOCeramics and CompositessymbolsGraphene0210 nano-technologyRaman spectroscopyJournal of Materials Science & Technology
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PLA-based functionally graded laminates for tunable controlled release of carvacrol obtained by combining electrospinning with solvent casting

2020

Abstract A novel approach was designed to fabricate high-added value manufacts, starting from cost-effective materials and combining well-known processing techniques. Bi- and three-layered, functionally graded laminates were achieved by direct electrospinning onto dense substrates. The architecture of each multilayer comprises a dense layer formed by solvent casting, which is constituted by polylactic acid (PLA) and carvacrol, and one or two electrospun fibrous skin layers, consisting of PLA only. Processing-structure-properties relationships of such materials were investigated. As regards mechanical behavior, the amount of fibrous PLA layers determined an increase of stiffness from 20 to 3…

Materials sciencePolymers and PlasticsGeneral Chemical Engineering02 engineering and technology010402 general chemistry01 natural sciencesBiochemistrychemistry.chemical_compoundPolylactic acidUltimate tensile strengthMaterials ChemistryEnvironmental ChemistryComposite materialControlled drug release Electrospinning onto film Functionally graded Multilayer Peppas model Solvent castingGeneral Chemistry021001 nanoscience & nanotechnologyControlled releaseCastingElectrospinning0104 chemical sciencesSolventSettore ING-IND/22 - Scienza E Tecnologia Dei MaterialichemistryElongation0210 nano-technologyLayer (electronics)Reactive and Functional Polymers
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On the possibility of synthesizing multilayered coatings in the (Ti,Al)N system by RGPP: A microstructural study

2019

International audience; Radiofrequency magnetron sputtering combined with reactive gas pulsing process was used to synthesize two titanium aluminum nitride multilayer films using a periodically controlled nitrogen flow rate changing from 0.4 to 1 sccm (sample S04-1) and from 0 to 1 sccm (sample S0-1). A metallic TiAl buffer layer was deposited on the etched substrates before the deposition to enhance their adhesion. The films were characterized using mainly transmission electron microscopy and electron diffraction. The role of the crystallinity of the buffer TiAl metallic layer deposited before gas introduction on the growth orientations is emphasized. It is shown that the formation of a mu…

Materials scienceThin films(Ti-Al-N) systemchemistry.chemical_element02 engineering and technologyNitride01 natural sciences[SPI.MAT]Engineering Sciences [physics]/Materials0103 physical sciencesMaterials ChemistryComposite material[SPI.NANO]Engineering Sciences [physics]/Micro and nanotechnologies/MicroelectronicsMicrostructure010302 applied physics[SPI.ACOU]Engineering Sciences [physics]/Acoustics [physics.class-ph]Surfaces and InterfacesGeneral ChemistrySputter deposition021001 nanoscience & nanotechnologyCondensed Matter PhysicsMicrostructureSurfaces Coatings and FilmsVolumetric flow ratechemistryElectron diffractionMultilayersTransmission electron microscopyTEM0210 nano-technologyLayer (electronics)Titanium
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Development of polymeric functionally graded scaffolds: a brief review.

2016

Over recent years, there has been a growing interest in multilayer scaffolds fabrication approaches. In fact, functionally graded scaffolds (FGSs) provide biological and mechanical functions potentially similar to those of native tissues. Based on the final application of the scaffold, there are different properties (physical, mechanical, biochemical, etc.) which need to gradually change in space. Therefore, a number of different technologies have been investigated, and often combined, to customize each region of the scaffolds as much as possible, aiming at achieving the best regenerative performance. In general, FGSs can be categorized as bilayered or multilayered, depending on the number…

Materials scienceTissue EngineeringTissue ScaffoldsPolymers0206 medical engineeringBiomedical EngineeringBiophysicsBioengineeringNanotechnologyFunctionally graded scaffoldBiocompatible Materials02 engineering and technologyGeneral Medicine021001 nanoscience & nanotechnology020601 biomedical engineeringBiomaterialsTissue engineeringMultilayerBilayer0210 nano-technologyJournal of applied biomaterialsfunctional materials
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Laser irradiation of ZnO:Al/Ag/ZnO:Al multilayers for electrical isolation in thin film photovoltaics

2013

Laser irradiation of ZnO:Al/Ag/ZnO:Al transparent contacts is investigated for segmentation purposes. The quality of the irradiated areas has been experimentally evaluated by separation resistance measurements, and the results are complemented with a thermal model used for numerical simulations of the laser process. The presence of the Ag interlayer plays two key effects on the laser scribing process by increasing the maximum temperature reached in the structure and accelerating the cool down process. These evidences can promote the use of ultra-thin ZnO:Al/ Ag/ZnO:Al electrode in large-area products, such as for solar modules. © 2013 Crupi et al.; licensee Springer.

Materials scienceTransparent electrodesThin film photovoltaicNanochemistryNanotechnologyTransparent electrode AluminumSettore ING-INF/01 - ElettronicaSettore FIS/03 - Fisica Della Materialaw.inventionElectrical isolationIrradiated areaMaterials Science(all)PhotovoltaicslawTransparent electrodes ; Multilayers; Pulsed laser scribingMultilayerGeneral Materials ScienceIrradiationThin filmLaser scribingNano Expressbusiness.industryMaximum temperaturePulsed laser scribingCondensed Matter PhysicsLaserThin film photovoltaicsMultilayersElectrical isolationElectrodeOptoelectronicsResistance measurementLaser scribing proceZinc oxide Film preparationbusinessLaser scribing
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Schottky barrier height tuning by Hybrid organic-inorganic multilayers

2014

ABSTRACTSemiconducting and insulating polymers and copolymers/Au nanograins based hybrid multilayers (HyMLs) were fabricated on p-Si single-crystal substrate by an iterative method that involves, respectively, Langmuir-Blodgett and spin-coating techniques (for the deposition of organic film) and sputtering technique (for the deposition of metal nanograins) to prepare Au/HyMLs/p-Si Schottky device. The electrical properties of the Au/HyMLs/p-Si Schottky device were investigated by current-voltage (I–V) measurements in the thickness range of 1-5 bilayers (BL).At different number of layers, current-voltage (I–V) measurements were performed. Results showed a rectifying behavior. Junction parame…

Materials sciencebusiness.industrySchottky barrierMechanical EngineeringSchottky diodeSchottkySubstrate (electronics)Condensed Matter PhysicMultilayer; Schottky; HybridHybridSemiconductorSputteringMechanics of MaterialsMultilayerOptoelectronicsRectangular potential barrierMaterials Science (all)businessDeposition (law)Diode
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Phase defect inspection of multilayer masks for 13.5 nm optical lithography using PEEM in a standing wave mode

2007

We report on recent developments of an "at wavelength" full-field imaging technique for defect inspection of multilayer mask blanks for extreme ultraviolet lithography (EUVL). Our approach uses photoemission electron microscopy (PEEM) in a near normal incidence mode at 13.5 nut wavelength to image the photoemission induced by the EUV wave field on the multilayer blank surface. We analyze buried defects on Mo/Si multilayer samples down to a lateral size of 50 nm and report on first, results obtained from a six inches mask blank prototype as prerequisite for industrial usage. (c) 2007 Elsevier B.V. All rights reserved.

Materials sciencebusiness.industryphotoemission electronExtreme ultraviolet lithographydefect analysisPhase (waves)Surfaces and InterfacesCondensed Matter PhysicsBlankSurfaces Coatings and Filmslaw.inventionStanding waveextreme ultraviolet lithography (EUVL)WavelengthPhotoemission electron microscopyOpticslawmultilayer mask blanksMaterials ChemistryOptoelectronicsEUV-PEEMPhotolithographybusinessLithographymicroscopy (PEEM)
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A new approach for actinic defect inspection of EUVL multilayer mask blanks: Standing wave photoemission electron microscopy

2006

Extreme ultraviolet lithography (EUVL) at 13.5 nm is the next generation lithography technique capable of printing sub-50 nm structures. With decreasing feature sizes to be printed, the requirements for the lithography mask also become more stringent in terms of defect sizes and densities that are still acceptable and the development of lithography optics has to go along with the development of new mask defect inspection techniques that are fast and offer high resolution (preferable in the range of the minimum feature size) at the same time. We report on the development and experimental results of a new 'at wavelength' full-field imaging technique for defect inspection of multilayer mask bl…

Materials sciencephotoemission electronbusiness.industryExtreme ultraviolet lithographyCondensed Matter Physicsmultilayer mask blankAtomic and Molecular Physics and OpticsSurfaces Coatings and FilmsElectronic Optical and Magnetic Materialslaw.inventionPhotoemission electron microscopyWavelengthOpticslawEUV lithographymicroscopyOptoelectronicsX-ray lithographyElectrical and Electronic EngineeringPhotolithographyactinic defect inspectionbusinessLithographyImage resolutionNext-generation lithographyMicroelectronic Engineering
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