Search results for "ta318"

showing 6 items of 16 documents

Plasma etch characteristics of aluminum nitride mask layers grown by low-temperature plasma enhanced atomic layer deposition in SF6 based plasmas

2012

The plasma etch characteristics of aluminum nitride (AlN) deposited by low-temperature, 200 °C, plasma enhanced atomic layer deposition (PEALD) was investigated for reactive ion etch (RIE) and inductively coupled plasma-reactive ion etch (ICP-RIE) systems using various mixtures of SF6 and O2 under different etch conditions. During RIE, the film exhibits good mask properties with etch rates below 10r nm/min. For ICP-RIE processes, the film exhibits exceptionally low etch rates in the subnanometer region with lower platen power. The AlN film’s removal occurred through physical mechanisms; consequently, rf power and chamber pressure were the most significant parameters in PEALD AlN film remova…

Materials scienceta221Analytical chemistryplasma etchingAtomic layer depositionEtch pit densityEtching (microfabrication)SputteringAIN filmsetchingta318Reactive-ion etchingThin filmta216ta116plasma depositionPlasma etchingta213ta114business.industryPhysicsSurfaces and Interfacesatomikerroskasvatusplasma materials processingCondensed Matter PhysicsSurfaces Coatings and Filmsplasmakasvatusthin filmsOptoelectronicsbusinessBuffered oxide etch
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Aluminum oxide from trimethylaluminum and water by atomic layer deposition:The temperature dependence of residual stress, elastic modulus, hardness a…

2014

Use of atomic layer deposition (ALD) in microelectromechanical systems (MEMS) has increased as ALD enables conformal growth on 3-dimensional structures at relatively low temperatures. For MEMS device design and fabrication, the understanding of stress and mechanical properties such as elastic modulus, hardness and adhesion of thin film is crucial. In this work a comprehensive characterization of the stress, elastic modulus, hardness and adhesion of ALD aluminum oxide (Al2O3) films grown at 110-300 C from trimethylaluminum and water is presented. Film stress was analyzed by wafer curvature measurements, elastic modulus by nanoindentation and surface-acoustic wave measurements, hardness by na…

Materials scienceta221Residual stressAluminum oxideStress (mechanics)Atomic layer depositionEllipsometryResidual stressHardnessMaterials Chemistryta318Thin filmComposite materialta216ta116Elastic modulusta213ta114Atomic layer depositionMetals and AlloysSurfaces and InterfacesNanoindentationSurfaces Coatings and FilmsElectronic Optical and Magnetic MaterialsElastic recoil detectionAdhesionElastic modulus
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VEGF-B-induced vascular growth leads to metabolic reprogramming and ischemia resistance in the heart

2014

Abstract Angiogenic growth factors have recently been linked to tissue metabolism. We have used genetic gain‐ and loss‐of function models to elucidate the effects and mechanisms of action of vascular endothelial growth factor‐B (VEGF‐B) in the heart. A cardiomyocyte‐specific VEGF‐B transgene induced an expanded coronary arterial tree and reprogramming of cardiomyocyte metabolism. This was associated with protection against myocardial infarction and preservation of mitochondrial complex I function upon ischemia‐reperfusion. VEGF‐B increased VEGF signals via VEGF receptor‐2 to activate Erk1/2, which resulted in vascular growth. Akt and mTORC1 pathways were upregulated and AMPK downregulated, …

VEGF‐Bmedicine.medical_specialtyMedicine (General)AngiogenesiseducationMOUSE HEARTIschemiaVEGF-B610 Medicine & healthmTORC1ischemiaBiologyQH426-470CONTRIBUTESchemistry.chemical_compoundangiogenesisR5-920CARDIAC-FUNCTIONInternal medicinemedicineGeneticsFAILUREta318Myocardial infarctionFATTY-ACID UPTAKEREPERFUSION INJURY610 Medicine & healthProtein kinase BMYOCARDIAL HYPERTROPHYAMPKta3121medicine.diseaseCell biologyARTERIOGENESISVascular endothelial growth factorMICEEndocrinologychemistry3121 General medicine internal medicine and other clinical medicineendothelial cellMolecular Medicine3111 BiomedicineReperfusion injurymetabolism
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Fight evolution with evolution: plasmid‐dependent phages with a wide host range prevent the spread of antibiotic resistance

2013

The emergence of pathogenic bacteria resistant to multiple antibiotics is a serious worldwide public health concern. Whenever antibiotics are applied, the genes encoding for antibiotic resistance are selected for within bacterial populations. This has led to the prevalence of conjugative plasmids that carry resistance genes and can transfer themselves between diverse bacterial groups. In this study, we investigated whether it is feasible to attempt to prevent the spread of antibiotic resistances with a lytic bacteriophage, which can replicate in a wide range of gram‐negative bacteria harbouring conjugative drug resistance–conferring plasmids. The counter‐selection against the plasmid was sh…

phage therapyPhage therapymedicine.drug_classmedicine.medical_treatmentAntibioticsta3111medicine.disease_causeMicrobiologyBacteriophageAntibiotic resistancePlasmidfaagiterapiaevolution of antibiotic resistanceGeneticsmedicineta318sairaalabakteerithospital bacteriaEcology Evolution Behavior and SystematicsGeneticsbiologyta1182Pathogenic bacteriaOriginal Articlesbiology.organism_classificationconjugative plasmid-dependent phagesantibioottivastustuskykyfagiterapiaHorizontal gene transferta1181General Agricultural and Biological SciencesBacteriaantibioottiresistenssiconjugationEvolutionary Applications
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High speed microfluidic prototyping by programmable proximity aperture MeV ion beam lithography

2013

Abstract Microfluidics refers to the science and technology for controlling and manipulating fluids that flow along microchannels. For the development of complex prototypes, many microfluidic test structures are required first. Normally, these devices are fabricated via photolithography. This technique requires a photomask for transferring a pattern to photoresists by exposing with UV light. However, this method can be slow when a new structure is required to change. This is because a series of photomasks are needed, which is time consuming and costly. Here, we present a programmable proximity aperture lithography (PPAL) technique for the development of microfluidic prototype in poly(methyl…

ta113Nuclear and High Energy PhysicsMaterials scienceFabricationApertureMicrofluidicsProcess (computing)NanotechnologyIon beam lithographylaw.inventionlawta318PhotomaskPhotolithographyInstrumentationLithographyNuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms
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Negative regulators of integrin activity

2012

ta1182ta318Journal of Cell Science
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