Search results for "zirconium"
showing 10 items of 303 documents
Electrochemistry of vanadium-doped ZrSiO4Site-selective electrocatalytic effect on nitrite oxidation
2004
The electrochemistry of vanadium-doped zircon (VxZrSiO4, 0 < x < 0.10) has been studied using abrasive-conditioned paraffin-impregnated graphite electrodes. It is compared with that of ZrSiO4, ZrO2, and vanadium-doped tetragonal and monoclinic zirconias. In contact with acetic/acetate and HCl + NaCl electrolytes, zirconium materials are reduced to Zr(III) at potentials near to −0.5 versus AgCl/Ag and to Zr metal at potentials more negative than −1.2 V, via proton-assisted reductive processes, influenced by the complexing action of chloride ions. Vanadium-centred oxidation processes appear at potentials from +0.2 to +0.7 V enabling for a distinction between different coordinative arrangement…
Determination of hydrogen peroxide using glassy carbon and graphite/polyester composite electrodes modified by vanadium-doped zirconias
2002
Abstract Synthetic monoclinic and tetragonal vanadium-doped zirconias (VZrO2) with vanadium loading ranging from 0.5 to 15 mol% are used to modify glassy carbon and graphite/polyester composite electrodes able to detect oxygen and hydrogen peroxide in neutral aqueous media. Electrodes modified by monoclinic VZrO2 decrease the overpotential for the reduction of oxygen and hydrogen peroxide in neutral and alkaline media and enhance their reduction currents with respect to unmodified carbon electrodes. This is associated to seven-coordinated vanadium centers isomorphously substituting zirconium ones in the ZrO2 lattice. The catalytic effect shows site-selectivity, since it is almost entirely a…
Zirconium, hafnium and yttrium complexes containing two linked amido— tetramethylcyclopentadienyl ligands: Synthesis, reactivity and molecular struct…
1998
Abstract Zirconium and hafnium complexes M(η5: η1−C5Me4SiMe2NR′)xCl(4−2x) (M = Zr, Hf; x = 1, 2; R′ = iPr, tBu) containing one or two linked amido-tetramethylcyclopentadienyl ligands C5Me4SiMe2NR′ have been synthesized by the reaction of the dilithium derivative Li2(C5Me4SiMe2NR′) with MCl4(THF)2. The crystal structure of the hafnium complex Hf(η5: η1−C5Me4SiMe2NiPr)2 has been determined by a single-crystal X-ray diffraction study and shows a C2-symmetric helical metallocene, in which the amido ligands are bonded as π-donor ligands with Hf—N bond lengths of 2.115(2) A. The isoelectronic heterobimetallic yttrium complex Li[Y(η5: η1−C5Me4SiMe2NCH2CH2OMe)2] reacts with phenylacetylene to give …
Separation of 90Nb from zirconium target for application in immuno-PET
2014
Abstract Fast progressing immuno-PET asks to explore new radionuclides. One of the promising candidates is 90Nb. It has a half-life of 14.6 h that allows visualizing and quantifying biological processes with medium and slow kinetics, such as tumor accumulation of antibodies and antibodies fragments or drug delivery systems and nanoparticles. 90Nb exhibits a positron branching of 53% and an average kinetic energy of emitted positrons of E mean =0.35 MeV. Currently, radionuclide production routes and Nb V labeling techniques are explored to turn this radionuclide into a useful imaging probe. However, efficient separation of 90Nb from irradiated targets remains in challenge. Ion exchange based…
Zirconium and hafnium complexes of the thio(bisphenolato) ligand: synthesis, structural characterization and testing as 1-hexenepolymerizationcatalys…
2009
Thio(bisphenolato) complexes of the type [M2(mu-tbop-kappa3O,S,O)2Cl4] [M = Zr 1, Hf 2 and tbop = 2,2-thiobis{4-(1,1,3,3-tetramethyl-butyl)phenolate}] were prepared by HCl elimination from tbopH2 and MCl4. Substitution of the chlorides in 1 and 2 by 2,6-diisopropylphenolato groups (dipp) generates new compounds [M2(mu-tbop-kappa3O,S,O)2(dipp)4] (M = Zr 3, Hf 4). The structures of 1-4 were confirmed by NMR spectroscopy; complexes 3 and 4 were further investigated by X-ray crystallography. These studies showed 1-4 to be dimers either in the solid state or in solution and to have metal centers adopting distorted octahedral geometry. However treatment of MCl4 with [Al2(mu-OEt)2(tbop-kappa3O,S,O…
Correction parameters in X-ray fluorescence analysis applying the limit dilution method (LDM)
1992
This paper is a study of the interelemental effect and its correction based on the mathematical model used to develop LDM in XRF analysis. A “compensation coefficient” is defined which is obtained from the quotient of the mass absorption coefficients of the problem and the standard (μs*/μp*). This coefficient compensates the effects produced by interactions between the analyt and the interferences and therefore acts as a correction factor for the interelemental effect within this theoretical model. The model itself establishes a simple relation of the “compensation coefficient” and the Y/H correction parameters for the unknown and the standard. An algorithm is proposed for calculating the “…
V-containing ZrO2 inorganic yellow nano-pigments
2015
In this work we report new results on the preparation, characterization and color properties of the inorganic yellow nano-pigmenting system based on monoclinic V–ZrO2 solid solution nanoparticles. The series of solid solution nanopowders were obtained by a polyol technique where the precipitates, obtained after heating at 180 °C ethylene glycol solutions of vanadyl acetonate and zirconium n-propoxide, were annealed at different temperatures up to 1300 °C for a short duration, in order to improve their crystallinity and control the crystalline form of the final nanoparticles. On annealing at around 450 °C highly crystalline tetragonal V-containing zirconia particles were developed, which tra…
A phenomenological approach to the mechanical breakdown of anodic oxide films on zirconium
1986
Abstract A phenomenological theory of the mechanical breakdown of films growing on valve metals during galvanostatic oxidation is presented and discussed in detail for ZrO2 anodic films. It is shown that the mechanical breakdown voltage, Vmb, can be linearly related to the logarithm of the anodizing current density both in the case of constant and variable critical thickness, Lc, at which the breakdown occurs. It is also shown that the Amb and Bmb parameters of the relationship: Vmb = Amb + Bmb log i are strictly related to the kinetic parameters of growth of the films in the different solutions. The expressions of Amb and Bmb parameters are derived for films grown in the presence as well a…
Coupling between Diffusion, Stress Field and Chemical Reaction in a Metal-Gas Oxidation
2000
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