0000000000025425

AUTHOR

Béla Pécz

showing 4 related works from this author

Barrier inhomogeneity in vertical Schottky diodes on free standing gallium nitride

2019

Abstract In this paper, the electrical behavior of a Ni/Au Schottky barrier on free standing GaN has been studied employing a variety of techniques and correlated with the material and interface quality. The temperature dependence of the ideality factor (n) and of the Schottky barrier height (ΦB) revealed a spatial inhomogeneity of the barrier. This behavior has been described by means of the Tung's model on inhomogeneous Schottky barriers. The origin of the barrier inhomogeneity can be likely associated to the surface quality of the GaN epilayer or to microstructure of the Ni/GaN interface.

010302 applied physicsMaterials scienceCondensed matter physicsMechanical EngineeringSchottky barrierSchottky diodeGallium nitride02 engineering and technology021001 nanoscience & nanotechnologyCondensed Matter PhysicsMicrostructure01 natural sciencesFree standing GaNchemistry.chemical_compoundQuality (physics)chemistryMechanics of MaterialsNi/GaN interface0103 physical sciencesGeneral Materials ScienceBarrier spatial inhomogeneity0210 nano-technologySchottky barrier
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Seed‐Layer‐Free Atomic Layer Deposition of Highly Uniform Al 2 O 3 Thin Films onto Monolayer Epitaxial Graphene on Silicon Carbide

2019

Atomic layer deposition (ALD) is the method of choice to obtain uniform insulating films on graphene for device applications. Owing to the lack of out-of-plane bonds in the sp(2) lattice of graphene, nucleation of ALD layers is typically promoted by functionalization treatments or predeposition of a seed layer, which, in turn, can adversely affect graphene electrical properties. Hence, ALD of dielectrics on graphene without prefunctionalization and seed layers would be highly desirable. In this work, uniform Al2O3 films are obtained by seed-layer-free thermal ALD at 250 degrees C on highly homogeneous monolayer (1L) epitaxial graphene (EG) (amp;gt;98% 1L coverage) grown on on-axis 4H-SiC(00…

SiCMaterials sciencePhysics::Opticslaw.inventionchemistry.chemical_compoundAtomic layer depositionlawLattice (order)MonolayerPhysics::Atomic and Molecular ClustersSilicon carbidePhysics::Chemical PhysicsThin filmCondensed Matter::Quantum Gasesatomic force microscopybusiness.industryAtomic force microscopyGrapheneMechanical EngineeringCondensed Matter Physicsepitaxial graphenechemistryMechanics of Materialsatomic layer depositionOptoelectronicsatomic force microscopy; atomic layer deposition; epitaxial graphene; SiCEpitaxial graphenebusinessDen kondenserade materiens fysikAdvanced Materials Interfaces
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Highly Homogeneous 2D/3D Heterojunction Diodes by Pulsed Laser Deposition of MoS2 on Ion Implantation Doped 4H-SiC

2022

In this paper, 2D/3D heterojunction diodes have been fabricated by pulsed laser deposition (PLD) of MoS2 on 4H-SiC(0001) surfaces with different doping levels, i.e., n− epitaxial doping (≈1016 cm−3) and n+ ion implantation doping (>1019 cm−3). After assessing the excellent thickness uniformity (≈3L-MoS2) and conformal coverage of the PLD-grown films by Raman mapping and transmission electron microscopy, the current injection across the heterojunctions is investigated by temperature-dependent current–voltage characterization of the diodes and by nanoscale current mapping with conductive atomic force microscopy. A wide tunability of the transport properties is shown by the SiC surface dopi…

Mechanics of Materialssilicon carbideMechanical Engineeringheterojunction diodesSettore FIS/01 - Fisica Sperimentaleconductive atomic force microscopyMoS2pulsed laser deposition
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Multiscale Investigation of the Structural, Electrical and Photoluminescence Properties of MoS2 Obtained by MoO3 Sulfurization

2022

In this paper, we report a multiscale investigation of the compositional, morphological, structural, electrical, and optical emission properties of 2H-MoS2 obtained by sulfurization at 800 °C of very thin MoO3 films (with thickness ranging from ~2.8 nm to ~4.2 nm) on a SiO2/Si substrate. XPS analyses confirmed that the sulfurization was very effective in the reduction of the oxide to MoS2, with only a small percentage of residual MoO3 present in the final film. High-resolution TEM/STEM analyses revealed the formation of few (i.e., 2–3 layers) of MoS2 nearly aligned with the SiO2 surface in the case of the thinnest (~2.8 nm) MoO3 film, whereas multilayers of MoS2 partially standing up with r…

SulfurizationGeneral Chemical EngineeringC-AFMMoS<sub>2</sub>; sulfurization; XPS; Raman; TEM; C-AFM; photoluminescenceArticleChemistryMoS<sub>2</sub>TEMXPSGeneral Materials ScienceMoS2QD1-999PhotoluminescenceRamanNanomaterials
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