0000000000085047

AUTHOR

Kanda Singkarat

showing 3 related works from this author

Fast and blister-free irradiation conditions for cross-linking of PMMA induced by 2MeV protons

2013

For soft lithography, the conventional negative tone resists, such as SU-8, that are used to create the mold have a number of drawbacks. PMMA, which is normally used as a positive tone resist, can be used as a negative resist by using high-fluence irradiation conditions. In this report, we outline optimization of the irradiation conditions for PMMA thin films using 2MeV H^+ ions to exploit their ability to work as a negative tone resist at ion fluences above 1.0x10^1^5ionscm^-^2. The main aim was to induce cross-linking while maintaining the exposed regions free of blisters and maintaining short irradiation times. We found that by using a two-step process with a low-flux irradiation, follow…

Ability to workMaterials scienceta114BlistersPhotoresistCondensed Matter PhysicsAtomic and Molecular Physics and OpticsSoft lithographySurfaces Coatings and FilmsElectronic Optical and Magnetic MaterialsIonResistmedicineIrradiationElectrical and Electronic Engineeringmedicine.symptomComposite materialThin filmMicroelectronic Engineering
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Development of economic MeV-ion microbeam technology at Chiang Mai University

2017

Abstract Developing high technologies but in economic manners is necessary and also feasible for developing countries. At Chiang Mai University, Thailand, we have developed MeV-ion microbeam technology based on a 1.7-MV Tandetron tandem accelerator with our limited resources in a cost-effective manner. Instead of using expensive and technically complex electrostatic or magnetic quadrupole focusing lens systems, we have developed cheap MeV-ion microbeams using programmed L-shaped blade aperture and capillary techniques for MeV ion beam lithography or writing and mapping. The programmed L-shaped blade micro-aperture system consists of a pair of L-shaped movable aperture pieces which are contr…

Nuclear and High Energy PhysicsMaterials scienceIon beamAperturemicrobeam02 engineering and technologyIon beam lithography01 natural scienceslaw.inventionOpticslaw0103 physical sciencesQuadrupole magnetInstrumentationLithography010302 applied physicsbusiness.industryta1182MicrobeamMeV ionL-shaped blade aperture021001 nanoscience & nanotechnologytapered glass capillaryComputer Science::OtherLens (optics)Physics::Accelerator Physicslithography0210 nano-technologybusinessBeam (structure)Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms
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Fabrication of a negative PMMA master mold for soft-lithography by MeV ion beam lithography

2012

Abstract In this study, poly(methyl methacrylate) (PMMA) was investigated as a negative resist by irradiation with a high-fluence 2 MeV proton beam. The beam from a 1.7 MV Tandetron accelerator at the Plasma and Beam Physics Research Facility (PBP) of Chiang Mai University is shaped by a pair of computer-controlled L-shaped apertures which are used to expose rectangular pattern elements with 1–1000 μm side length. Repeated exposure of rectangular pattern elements allows a complex pattern to be built up. After subsequent development, the negative PMMA microstructure was used as a master mold for casting poly(dimethylsiloxane) (PDMS) following a standard soft-lithography process. The PDMS chi…

Nuclear and High Energy PhysicsFabricationMaterials scienceta114business.industryMicrofluidicsNanotechnologyPhotoresistIon beam lithographyCastingSoft lithographyOptoelectronicsIrradiationbusinessInstrumentationBeam (structure)Nuclear Instruments and Methods in Physics Research B
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