6533b872fe1ef96bd12d39e6
RESEARCH PRODUCT
Fabrication of a negative PMMA master mold for soft-lithography by MeV ion beam lithography
S. SingkaratNitipon PuttaraksaNitipon PuttaraksaKanda SingkaratSomrit UnaiHarry J. WhitlowMichael W. Rhodessubject
Nuclear and High Energy PhysicsFabricationMaterials scienceta114business.industryMicrofluidicsNanotechnologyPhotoresistIon beam lithographyCastingSoft lithographyOptoelectronicsIrradiationbusinessInstrumentationBeam (structure)description
Abstract In this study, poly(methyl methacrylate) (PMMA) was investigated as a negative resist by irradiation with a high-fluence 2 MeV proton beam. The beam from a 1.7 MV Tandetron accelerator at the Plasma and Beam Physics Research Facility (PBP) of Chiang Mai University is shaped by a pair of computer-controlled L-shaped apertures which are used to expose rectangular pattern elements with 1–1000 μm side length. Repeated exposure of rectangular pattern elements allows a complex pattern to be built up. After subsequent development, the negative PMMA microstructure was used as a master mold for casting poly(dimethylsiloxane) (PDMS) following a standard soft-lithography process. The PDMS chip fabricated by this technique was demonstrated to be a microfluidic device.
| year | journal | country | edition | language |
|---|---|---|---|---|
| 2012-02-01 | Nuclear Instruments and Methods in Physics Research B |