0000000000189701
AUTHOR
M. D. Reyes Tolosa
Electrochemical Deposition Mechanism for ZnO Nanorods: Diffusion Coefficient and Growth Models
Fabrication of nanostructured ZnO thin films is a critical process for many applications based on semiconductor devices. So on understanding of the electrochemical deposition mechanism is also fundamental for knowing the optimal conditions on growth of ZnO nanorods by electrodeposition. In this paper the electrochemical mechanism for ZnO nanorods formation is studied. Results are based on the evolution of the diffusion coefficient using the Cotrell equation, and different growth models proposed by Scharifcker and Hills for nucleation and growth.
ZnO Nanoestructured Layers Processing with Morphology Control by Pulsed Electrodeposition
The fabrication of nanostructured ZnO thin films is a critic process for a lot of applications of this semiconductor material. The final properties of this film depend fundamentally of the morphology of the sintered layer. In this paper a process is presented for the fabrication of ZnO nanostructured layers with morphology control by pulsed electrodeposition over ITO. Process optimization is achieved by pulsed electrodeposition and results are assessed after a careful characterization of both morphology and electrical properties. SEM is used for nucleation analysis on pulsed deposited samples. Optical properties like transmission spectra and Indirect Optical Band Gap are used to evaluate th…